以電漿放射光譜技術探討電漿表面改質高分子膜之研究

Study on Plasma Modification of Polymer Membranes by Optical Emission pectroscopy

林佩穎(Pei-Ying Lin)

指導教授 ： 魏大欽

中原大學/工學院/化學工程學系/碩士(2006年)

https://doi.org/10.6840/cycu200600449

摘要

本研究以電漿放射光譜技術探討電漿氣相物種對高分子表面改質之影響，第一部份以氨氣與氮氣/氫氣電漿改質聚四氟乙烯 (Polytetrafluoroethylene，PTFE)，藉由放射光譜儀進行定性與半定量分析，再以接觸角、ESCA與SEM分析電漿改質後膜材之親水性、化學元素組成與物理型態之變化後，探討其間之關聯性以了解影響親水性之因素。

實驗結果發現氫氣含量為65% 至 80% 之氮氣/氫氣電漿不僅能有效提升PTFE之膜面親水性，亦能代替具有腐蝕性之氨氣。且PTFE膜材放置位置於放電區、過渡區與後輝光區之各分析結果中，發現膜材親水性最佳之處為過渡區，即電漿改質膜材時，除了氫原子濃度與親水化程度有最直接之關係外，再給予適當之離子效應輔助斷鍵，造成最佳改質效能。

為了將放射光譜之結果回饋至控制系統，以提升機台長期操作之穩定性，且在光譜發生異常時即可提出警報並停止運作，因此本研究第二部份使用即時放射光譜儀作為氧氣電漿改質聚丙烯不織布 (PP-nonwoven) 之分析探討，發現由即時放射光譜所量測之改質物種與蝕刻產物濃度隨時間之變化情形，可得知最佳改質時間，並可作為電漿改質製程中即時監控之分析因子。

關鍵字

放射光譜儀 ； 電漿表面改質 ； 氨氣 ； 氮氣/氫氣 ； 聚四氟乙烯

並列摘要

In this study, Optical Emission Spectroscopy (OES) was used to investigate the influences of plasma species on the surface modification of polymer membranes. Polytetrafluoroethylene membranes were subjected to NH3 and N2/H2 plasma treatment to enhance the surface wettability.
It was found that nitrogen-containing functional groups can be incorporated onto PTFE surface by both plasma treatments, resulting in a significant increase of surface wettability. The surface wettability reaches the maximum at the feed ratio (H/N+H) between 0.65 and 0.8. In addition, the effects of substrate position on the surface wettability were also investigated. It was found that the effective zone for improving surface wettability of PTFE is at the end of the plasma discharge (or the beginning of the afterglow). The trend of wettability enhancement was found to correspond well to the increase of H-atom density measured by OES. Consequently, the defluorination and the incorporation of hydrophilic functionalities only occur in PTFE placed in the region where ion bombardment and H-atom reactions co-exist.
The second part of this study is real-time OES measurement on the modification of PP-nonwoven with O2 plasma. It was found that the intensities of reactive species and etching products in the plasma are a function of plasma operational parameters. The optimal plasma treatment time can be determined from OES measurement, suggesting that OES is indeed a good tool for real-time feedback control of surface modification by plasma.

並列關鍵字

NH3 ； N2/H2 ； Optical emission spectroscopy ； Plasma modification ； PTFE

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