平面載體含部份覆蓋活化體之分佈對擴散限制程序之效應

Effect of the Patch Distribution of A Planar Surface on A Diffusion-Limited Process

林宜溱(Yi-Zhen Lin)

指導教授 ： 吳瑞璋

中原大學/工學院/化學工程研究所/碩士(2010年)

https://doi.org/10.6840/CYCU.2010.00559

摘要

本研究以虛擬的立體空間為主題，假設此空間有上下兩個相同大小的平板，懸浮粒子由空間中隨機釋放之後，以加速布朗運動的原理在兩平板間隨機擴散，最後與下平板的活性綴片瞬間反應。
過程中先計算微細粒子行走的路徑，且將模擬結果與理論值做一比較，兩者間之誤差值不超過±0.05%，這樣的結果可證明本研究使用之電腦程式編輯無誤。所以更進一步探討粒子行走路徑與 的關係後，驗證以下『全覆蓋』之通式( f : full coverage)：

接著進行『二維平面部份覆蓋分子擴散限制』之模擬，以總數1000000顆測試粒子，一次釋放一個的方式，模擬擴散及結合系統。
發現以下現象：1.當綴片分佈愈鬆散(Is 愈大)，其 亦隨之增加，2.覆蓋率愈大，其 亦隨之增加，3.當相同覆蓋率相同且小於0.5，綴片愈小，其 隨之增加；但覆蓋率大於0.5時，綴片大小對於 之影響不大，4.當綴片數量變多、分佈鬆散到一飽和狀況時(覆蓋率約0.5以上)，其速率常數就不會再增加了。

關鍵字

平面載體

並列摘要

This study focuses on the virtual three-dimension parallel space instead of spherical systems published in the past.Two plates with the same size are placed in the space.A suspended particle is released randomy within the space and diffuse toward the bottom plate in the sped-up Brownian dynamic simulation, and it will finally react instantaneously with the active patches on the lower plate.
A comparison between the simulation results and theoretical values is made the particle path computated. The deviation is within ± 0.05% from the literature, which verifies that the computer code used in this study is valid. The ratio of is further correlated with the particle’s traveling path and gives as ::
n= 1, 2,3 (dimensions)
The simulation of diffusion-limited process in a two-dimensional partial-coverage planar system reveals an increase of for both larger Is ( looser patch distribution ) and higher coverage. Howere, patch size a little effect on the value of for the two-dimensional partial-coverage planar system. Incorporated rate shows no increase at the saturated condition with the coverage approximately above 0.5 for the looset patch distribution.The simulation totally releases one million test particles, with releasing one at one time.

並列關鍵字

planar surface

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