利用低溫濺鍍法成長單晶氧化鋅薄膜

Single Crystalline Growth of Zinc Oxide Thin Films Using Low Temperature Sputtering

劉旻杰(Min-Jie Liou)

指導教授 ： 高慧玲

中原大學/電機資訊學院/電子工程研究所/碩士(2019年)

https://doi.org/10.6840/cycu201900483

摘要

本論文利用射頻磁控濺鍍系統沉積單晶氧化鋅薄膜於藍寶石基板上，並藉由調整不同參數尋找能提升氧化鋅薄膜品質的最佳化製程，接著分析氧化鋅晶體結構與結晶品質來驗證薄膜的結晶性。
　　本實驗藉由X光繞射儀來量測氧化鋅薄膜，由結果顯示出氧化鋅薄膜皆具有C軸從優取向的特性，接著利用ω-scan量測ZnO(0002)搖擺曲線之半高寬，隨著製程的不同半高寬的值從2.45∘逐漸降低到1.24∘，並從TEM之電子繞射圖形看到具有週期性的繞射點，由此證實ZnO薄膜具有單晶結構，再從明暗場圖以及高解析度TEM觀察ZnO薄膜的沉積狀況。

關鍵字

射頻磁控濺鍍系統 ； 單晶氧化鋅薄膜 ； 藍寶石基板

並列摘要

In this thesis, the single crystalline zinc oxide (ZnO) films were deposited on sapphire substrates using RF magnetron sputtering system. The film quality is optimized by adjusting growth parameters. The structural characteristics of zinc oxide films were analyzed by X-ray diffractometer (XRD) and Transmission electron microscope (TEM) measurement.
The results of the X-ray diffractometer show that all the zinc oxide films exhibit the characteristic of c-axis preferential orientation. The full-width of half maximum (FWHM) of the ZnO (0002) rocking curve decreases from 2.45 degrees to 1.24 degrees for the films grown with various process conditions. The electron diffraction pattern of the TEM as well as the XRD phi scan revealed that the ZnO thin film has a single crystal structure. The microstructure of ZnO films was observed by bright and dark field images and the high resolution of TEM.

並列關鍵字

RF magnetron sputtering system ； single crystalline ZnO ； sapphire

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