- 學位論文
以DC磁控濺鍍沉積氧化釩薄膜電致色變性質之研究
An investigation of electrochromic properties of vanadium oxide thin films deposited by DC magnetron sputtering
摘要
本論文利用DC反應磁控濺鍍法在ITO玻璃基板上沉積電致色變材料，利用不同的製程參數：不同氧氣流量(氧氣分量範圍：14%~45%)、沉積不同厚度氧化釩(vanadium oxide)薄膜以進行退火，並利用三極系統探討氧化釩薄膜於濃度0.1M碳酸丙烯(PC) -氯酸鋰(LiClO4)為電解質液中其電化學與電致色變性質。使用X光繞射分析(XRD)、X光光電子能譜儀(XPS)、場發式電子顯微鏡(FESEM)、紫外光-可見光光譜儀(UV)及循環伏安儀(CV)進行分析，探討對氧化釩薄膜之光學性質、組成分析與微觀結構性質。 由實驗結果得知，本實驗的氧化釩薄膜結構均為非晶質(amorphous)結構。薄膜在氧氣分量為33%時，在波長為550nm之可見光下著、去色穿透率變化(ΔT)為17.2％及光學密度(ΔOD)為0.13；氧氣分量為40%時有最多電荷量注入，造成大的循環面積，且有著較其他薄膜良好的電化學穩定性。不同的薄膜厚度經真空下退火後，有從優取向(110)結晶相，在薄膜厚度200nm有良好的穿透率差異(ΔT)為26.5％以及光學密度(ΔOD)為0.23。薄膜厚度為300nm時，有最多的電荷量注入，隨著循環圈數增加，注入電荷量面積變化不大，穩定度高。
並列摘要
In this paper, vanadium oxide thin films were deposited on ITO glasses substance by D.C magnetron reactive sputtering with different process of parameter: various O2 atmospheres (the flow rate range was 14%~45%) and various thickness of vanadium oxide thin films proceeded to anneal. The electrochemical and electrochromic properties of vanadium oxide thin films were brought out using a three-electrode cell system with a 0.1M electrolyte of lithium perchlorate in propylene carbonate.The optical properties, composition and microstructure of vanadium oxide with various O2 flow rate and various thickness after annealing were be determined by X-ray diffraction, XPS, FESEM, UV-visible spectrometer and cycilc voltammety. Experimental results indicated that structure of vanadium oxide thin films are amorphous. At the oxygen flow rates of 33%, the transmission change between colored and bleached states at a wavelength of 550nm was 17.2% and optical density about 0.13. On the side, the inject of charge quantity increased to form main cyclic area at the oxygen flow rates of 40% and good electrochemical stability than other thin films. The various thickness of thin films were with a crystal phase(110) after annealing at vacuum atmosphere. When vanadium oxide thin films thickness was 200nm the vanadium oxide thin film had a good transmittance change about 26.5% and optical density about 0.23. Besides, when the thickness was 300nm had a largest inject charge quantity, the charge area wasn’t change obviously with the increase of cycles and had a high stability.