可撓式塑膠基板上製備有機/無機氮氧化矽多層氣體阻障層及其機械撓曲特性之研究

A Study on Mechanical Flexibility of Silicon Oxynitride and Organic/inorganic Multilayered Barrier Structures Deposited on Flexible Plastic Substrates

黃吉廷(Ji-Ting Huang)

指導教授 ： 劉代山

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2014年)

摘要

本研究以四甲基矽烷（tetramethysilane; TMS）、氨氣與氧氣等混合氣體為源氣體，利用電漿增強化學氣相沉積系統（Plasma-enhanced chemical vapor deposition; PECVD），在可撓式塑膠基板上，於低溫環境下製備具有優異氣體阻障能力的有機/無機氮氧化矽多層氣體阻障薄膜，並加入有機矽基薄膜做為緩衝層，製備多層有機矽基/無機氮氧化矽薄膜結構，藉由調變有機矽基層薄膜厚度，控制整體結構的內應力，改善水氣阻障能力，研究顯示，可以使厚度為300 nm之單層氮氧化矽薄膜的薄膜殘留內應力(-372 Mpa)，當加入適當厚度的有機矽基薄膜做為緩衝層後，其薄膜殘留應力下降至-303 Mpa，且薄膜於塑膠基板之附著度並可從3B等級提升至5B等級，另外在最佳化之三對有機/無機氮氧化矽薄膜結構藉由鈣測試法(Calcium test)量測其水氣滲透率，於室溫下觀察水氣滲透率約為5.5×10^-4 g/m^2/day。另外，利用自製的彎曲測試器具，觀察最佳化多層結構於不同撓曲形態下之薄膜表面形貌情形以及其對水氣滲透率之影響，研究顯示，加入有機矽基薄膜做為緩衝層後，一對、二對以及三對多層結構，均能優於相對厚度300 nm、600 nm以及900 nm的臨界破裂曲率，顯示出多層薄膜結構沉積在可撓式塑膠基板上具有較佳的撓曲可靠性。最後，本研究將其多層有機矽基/無機氮氧化矽結構應用於有機發光二極體(Organic light emitting diode; OLED)之封裝製程中，將製備於軟性塑膠基板上之300nm 單層氮氧化矽做為蓋板，相較於未封裝裸片有機發光二極體，其操作壽命可以從53個小時提升至314個小時，其壽命可提升約6倍，另外，直接將300nm 單層氮氧化矽製備於有機發光二極體元件上做為薄膜封裝，其操作壽命可以從53個小時提升至159個小時，其壽命提升約3倍。

關鍵字

電漿增強化學氣相沉積法 ； 氮氧化矽 ； 氣體阻障層 ； 水氣滲透率

並列摘要

In this study, tetramethyl silane (tetramethysilane; TMS), ammonia gas is mixed with oxygen and other sources of gas, electricity pulp interest enhanced chemical vapor deposition system (Plasma-enhanced chemical vapor deposition; PECVD), in the flexible plastic substrate organic / inorganic oxynitride on multi-gas at low temperatures preparation has excellent gas barrier film barrier capability and adding organic silicon thin film as a buffer layer prepared multilayer organic silicon / silicon oxynitride inorganic thin film structure, by modulating the grassroots organic silicon film thickness, control the overall structure of the internal stress, improve water vapor barrier ability, research shows that you can make a film thickness of a single layer of residual stress silicon oxynitride film 300 nm of the (-372 Mpa) when the addition of a suitable organic silicon film thickness as a buffer layer to decrease the residual stress film -303 Mpa, and in the adhesion of the plastic film may be lifted from the substrate 3B to 5B grade level, while in the optimization of three pairs of organic / inorganic oxynitride film structure by calcium test method (Calcium test) measure its water vapor permeability, water vapor was observed at room temperature penetration rate of approximately 5.5 × 10-4 g/m2/day. After the addition, the use of homemade bend test equipment, optimized multilayer structure observed in the surface morphology deflection shape under different circumstances and their impact on water vapor permeability, the study showed that the addition of organic silicon thin film as a buffer layer , one, two, and three pairs of the multilayer structure, than can the relative thickness 300 nm, 600 nm and 900 nm curvature critical breakage, showing the structure of a multilayer film having deposited on the flexible plastic substrate is preferably a flexural reliability. Finally, the study of its silicon multilayer organic / inorganic oxynitride structures used in organic light-emitting diodes (Organic light emitting diode; OLED) of the packaging process, the preparation at 300nm on a single layer of silicon oxynitride flexible plastic substrate as cover, compared to unpackaged die organic light-emitting diodes, which can improve the operating life from 53 hours to 314 hours, which can improve the life of about six times, in addition to directly to the 300nm single layer SiON Preparation as a thin film encapsulation on organic light-emitting diode device, which can improve the operating life from 53 hours to 159 hours, about three times the life upgrade.

並列關鍵字

plasma-enhanced chemical vapor deposition ； silicon oxynitride ； gas barrier layer ； WVTR

參考文獻

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