利用二次沉積法製備表面結構化非晶氧化鈦薄膜及其光觸媒特性之研究

在本研究中，利用電漿增強化學氣相沉積系統，以有機材料四異丙氧化鈦與氧氣為源材料，於基板溫度為150℃環境下製備非晶氧化鈦薄膜，並使用氧化鋁濾膜為光遮罩，透過波長為365 nm紫外光照射薄膜表面，藉以選區活化薄膜表面進行濕式蝕刻製程，製備表面結構之氟化非晶氧化鈦薄膜。透過二次沉積法，於表面改質之結構化基底層上，進行第二層非晶氧化鈦薄膜沉積，藉由改變製程參數，探討其成長機制及薄膜特性。研究結果顯示，利用原子力顯微鏡分析，經由二次沉積後，表面結構化之非晶氧化鈦薄膜表面粗糙度為22.47 nm，相較於非晶氧化鈦薄膜，有明顯之提升，且透過場效發射式掃描電子顯微鏡觀察，表面形貌有顯著高低分布之奈米柱狀結構。利用傅立葉轉換紅外線光譜分析分析，顯示表面結構化非晶氧化鈦薄膜具有鈦-氟鍵結以及氫-氧鍵結含量較多，可增加對水分子之吸附能力，並透過化學成分分析可得知，表面結構化之非晶氧化薄膜，其氟離子為表面吸附，可提升薄膜光觸媒特性，亞甲基藍分解反應速率常數為0.0204 K/min。研究中，分別於不同基底層上沉積非晶氧化鈦薄膜，其中以表面結構氟化非晶氧化鈦基底層上沉積第二層非晶氧化鈦薄膜，具有較佳的亞甲基藍分解反應速率常數為0.0249 K/min且表面粗糙度可達30.09 nm。非晶氧化鈦薄膜經熱處理製程後，具有優異的光觸媒特性，但使得薄膜較無法應用在低抗熱的基材或元件改質製程中，故在表面結構氟化非晶氧化鈦基底層上沉積非晶氧化鈦薄膜，將可提升光觸媒特性。

關鍵字

電漿增強化學氣相沉積；二次沉積；表面結構化；非晶氧化鈦薄膜；濕式蝕水溶液；光觸媒特性

並列摘要

In this study, an amorphous titanium oxide thin film was prepared plasma enhanced chemical vapor deposition(PECVD) at a substrate temperature of 150 ℃ using titanium- tetraisopropoxide(TTIP) and oxygen as source material. Surface-textured TiOx base layer was prepared by selectively pre-irradiating on the film through an alumina membrane mask and and then etching by the dilute hydrofluoric (HF) solution. A second layer of amorphous titanium oxide thin film was deposited on the surface-textured TiOx base layer by twice deposition . The surface morphologies and roughness of the amorphous surface-textured TiOx base layer affected by the UV light pre-irradiation were conducted from AFM and FE-SEM investigations. Roughness of surface-textured TiOx base layer is 22.47 nm,, accordingly, a rough surface with nano-textured morphology, which corresponded to a large specific surface area compared to the amorphous titanium oxide thin film. Surface morphology of surface-textured TiOx base layer is distribution of columnar structure. Fourier transform infrared spectroscopy analysis shows the surface textured of amorphous titanium oxide thin film adsorbed F- on the film surface during fluorination process resulted in the change on the surface hydroxyl groups and the formation of the Ti−F chemical state, which increased the adsorption capacity for water molecules and its surface adsorption of fluoride ions can enhance photocatalytic properties. The amorphous surface-textured TiOx base layer of methylene blue degradation reaction rate constant was 0.0204 K / min. The second amorphous titanium oxide film is deposited on surface-textured TiOx base layer, and its reaction rate constant of methylene blue was 0.0249 K / min. The surface roughness of surface-textured TiOx bilayer is up to 30.09 nm. Amorphous titanium oxide film after the heat treatment process will enhance photocatalytic properties, but the film in the low heat resistance can not be applied. The structure of amorphous titanium oxide film is deposited on the fluorinated amorphous titanium oxide base layer will enhance the photocatalytic properties.

並列關鍵字

plasma-enhanced chemical vapor deposition ； twice deposition ； amorphous TiOx film with surface-textured structure ； wet etching solution ； photocatalytic characteristics

參考文獻

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[2] Akira Fujishima, Xintong Zhang, Donald A. Tryk, 2008, “TiO2 photocatalysis and related surface phenomena.”, Surface Science Reports, 63, pp.515-582.

[3] V. Tamilselvan, D.Yuvaraj, R.Rakesh Kumar, K.Narasimha Rao, 2012,“Growth of rutile TiO2 nanorods on TiO2 seed layer deposited by electron beam evaporation.”, Applied SurfaceScience, 258,pp. 4283-4287.

[4] Ying CUI, Hao DU, Jinquan XIAO and Lishi WEN, 2008, “Effects of Power Density and Post Annealing Process on the Microstructure and Wettability of TiO2 Films Deposited by Mid-frequency Magnetron Reactive Sputtering.”, J. Mater. Sci. Technol, 24(2), pp. 172-178.

[5] M. Maeda, T. Watanabe, 2005, “Evaluation of photocatalytic properties of titanium oxide films prepared by plasma-enhanced chemical vapor deposition.”, Thin Solid Film, 489, pp.320-324.

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利用二次沉積法製備表面結構化非晶氧化鈦薄膜及其光觸媒特性之研究

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