具可見光光觸媒特性及結構化二氧化鈦薄膜之製作與分析

本研究利用電漿增強化學氣相沉積法，以有機材料-四異丙烷氧化鈦、氨氣及氧氣為源材料於基板升溫200oC環境下製備氮摻雜二氧化鈦薄膜，期望藉由氮摻雜二氧化鈦薄膜光吸收邊界紅移至可見光區域，提高光觸媒特性之效能，以利應用於日常生活中；另外為了能夠進一步提高未摻雜二氧化鈦薄膜的光觸媒特性，本研究利用不同微奈米等級遮罩，透過紫外光照射薄膜表面，使其形成結構化表面活化區域，而後進行濕式蝕刻，藉以形成表面結構化型態，提升未摻雜二氧化鈦薄膜的光觸媒活性反應面積。研究結果顯示，在最佳化製程及熱處理參數下所製備之氮摻雜二氧化鈦薄膜，經由可見光照射三小時後，薄膜具有超親水特性(50以下)，且對於亞甲基藍溶液之分解速率值(k)達0.135h-1，從XRD量測結果中發現，此時之TiO2-xNx薄膜具有最佳的銳鈦礦結晶相(101)。而在結構化二氧化鈦光觸媒薄膜製備之研究方面，由實驗結果可得知在適當的氫氟酸溶液下當蝕刻時間過5分鐘時，使用孔徑為300μm的遮罩可以進一步增加活化結構的接觸表面積，提高光觸媒薄膜對於亞甲基藍溶液的分解速率，而當遮罩孔徑縮小至奈米等級(200 nm)時，其光觸媒降解特性更加顯著提升。

關鍵字

電漿化學氣相沉積法；氮摻雜二氧化鈦薄膜

並列摘要

In this study, the organic material titanium-tetraisopropoxide (TTIP), ammonia and oxygen were used as the source, and nitrogen doped titanium dioxide thin films were prepared by plasma enhanced chemical vapor deposition on the substrate temperature were 200oC to produce. The created optical thin film was in hope to absorbance to red shift moving toward the visible light area, and to improve the performance of the photocatalytic properties which facilitates in our daily lives; furthermore, in order to further increase the photocatalytic properties of the non-doped titanium dioxide thin film, the study used various micro- and nano-level shields. Use UV irradiation the thin film surface, an activated structured area was formed which further underwent wet etching. The pattern structure formed on the surface with this method enhanced the photocatalytic active reaction area for the non-doped part of the titanium dioxide thin film. The results show that the as the nitrogen-doped titanium film produced by the optimal process and thermal treatment parameters was exposed under visible light for three hours, the thin film then featured with ultra-hydrophilic properties (below 50), and the best photocatalytic activity with the rate value (k) about 0.135h-1. In addition, XRD results showed that at the very moment the TiO2-xNx thin film had the optimal anatase crystalline phase (101). As for the research in the preparation of structured titanium dioxide photocatalyst thin films, experimental results showed that under the appropriate amount of HF solution with a 5min etching time, a 300μm-aperture shield can further increase the contact surface area of the activated structure. This increased the decomposition rate of the photocatalyst thin film toward methylene blue solution. Furthermore, when the aperture shield reduced to the nano level (200 nm), the photocatalytic decomposition characteristics significantly increased.

並列關鍵字

PECVD ； TiO2-xNx thin film

參考文獻

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