以光化學蝕刻法製作表面結構化之非晶氧化鈦薄膜及其應用於有機發光二極體元件之研究

A Study on Preparation of Surface-Texture of the Amorphous Titanium Oxide Thin Film by Photochemical Etched Method and Its Application on the Organic Light-Emitting Diodes

洪少強(Shao-Chyang Hong)

指導教授 ： 劉代山

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2011年)

https://doi.org/10.6827/NFU.2011.00071

摘要

在本研究中，首先利用電漿增強化學氣相沉積系統，以有機材料四異丙氧化鈦與氧氣為源材料，於基板溫度為200℃環境下沉積厚度約為200 nm之非晶氧化鈦薄膜。然後，利用氧化鋁濾膜為光遮罩並透過紫外光波長為365 nm照射，藉以選區活化非晶氧化鈦薄膜的表面，接著，再利用濕式蝕刻水溶液及光化學蝕刻方法進行表面改質製程，藉由紫外光照射薄膜後表面活化所產生之氫氧自由基，降低對於薄膜之蝕刻速率，使得表面產生高低位階差，進而製備出表面結構化之非晶氧化鈦薄膜。藉由上述製程方式所製備出表面結構化之非晶氧化鈦薄膜，使得薄膜表面的粗糙度有顯著的上升並導致接觸比表面積的提高，藉由表面結構化型態增加光觸媒受光面積，達到提昇非晶氧化鈦薄膜的光觸媒分解效能進而優化非晶氧化鈦薄膜的光觸媒特性。

最後，將非晶氧化鈦薄膜以光化學蝕刻法進行表面改質製程並應用於有機發光二極體元件上，除了讓有機發光二極體的表面具有超親水自清潔性，更能提高有機發光二極體元件的光汲取效率，使得有機發光二極體元件具有自清潔、防污、抗菌、以及防霧等自淨化功能，並提昇有機發光二極體元件照明設備在節能及環保議題上的產業應用價值。

關鍵字

電漿增強化學氣相沉積 ； 光觸媒特性 ； 表面結構化 ； 氧化鋁濾膜 ； 濕式蝕刻水溶液 ； 有機發光二極體元件

並列摘要

Abstract
In this study, amorphous titanium dioxide thin films thickness of 200nm produced by plasma enhanced chemical vapor deposition (PECVD) at the substrate temperature were 200oC from mixture the organic material titanium-tetraisopropoxide (TTIP) and oxygen gas.
Then, the film with activated surface which was irradiated UV light whose irradiation with the peak intensity of 365nm pass through a nano-sized anodic alumina membrane as the optical mask electing.Subsequently, Using wet- etching solution and photochemical etching by surface-textured process. Reducing the etching rate for thin films, after amorphous titanium dioxide thin films with activated of hydroxyl radicals surface under UV irradiation. To obtain surface-textured of amorphous titanium dioxide thin films .According to the way processed to obtain surface-textured of amorphous titanium dioxide thin films. This indicated that thin films with surfae-textured promoted some the surface roughness, increasing surface roughness , enhancing the photocatalytic decomposition of amorphous titanium oxide thin film , optimizing the performance of amorphous titanium oxide thin film photocatalytic activate properties.
Finally, surface-texture of the amorphous titanium oxide thin film by photochemical etched method applied to the organic light-emitting diodes, having hydrophilic self-cleaning of the surface. It can enhance organic light emitting diode light derives the efficiency. Organic light emitting diode device with self-cleaning, antifouling, antibacterial, anti-fog and other self-cleaning function, so that organic light emitting diode light energy conservation and environmental issues in the industrial application.

並列關鍵字

plasma enhanced chemical vapor deposition ； photocatalytic activate properties ； surfacre-texture ； anodic alumina membrane ； wet- etching solution ； organic light emitting diode

參考文獻

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Photochemistry Photobiology A: Chemistry 179 , 213