無自身反射之非對稱布拉格耦合元件之研製

A Fabrication of Asymmetric Bragg Coupler without Self-reflection

陳仕委(Shr-Wei Chen)

指導教授 ： 莊為群

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2010年)

摘要

本研究以全像干涉微影技術在波導上製作光柵之製程技術，來製作雙通道濾波元件。
在此實驗中應用微積電製程技術與光學干涉技術的互相配合，其中包含軟式硬刷技術、微接觸印刷、複製成形技術與光學干涉微影技術等，綜合以上之製程方法製作出高分子波導模仁，並將此波導模仁翻印至黃光微影製程之光柵元件上，使其成為一雙通道濾波元件。
此高分子波導元件翻膜模仁可達到大量生產的效果，且此法具有製作容易、和低成本之優點。
研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)等方法觀察與紀錄實驗之結果。

關鍵字

全像干涉微影技術 ； 軟式硬刷技術 ； 微接觸印刷

並列摘要

In this research, it is to fabricate bi-channel filters with a technology to fabricate Grating on Waveguide by using techniques of Holographic inference and Photolithography.
In this experiment, it cooperate the technique MEMS fabrication and optical lithography to fabricate the master molding of polymer Waveguide along with techniques of microcontact printing, replica printing and soft printing, how it fabricated out the bi-channel filter is to stamp in the grating with waveguide mold into grating the of using photolithography formation.
It is easily to achieve the mass production, easy fabrication and low cost by using technique of lift molding of polymeric Waveguide.
In order to observe and record the results of this experiment accurately, we utilize the AFM (Atomic Force Microscopy) and SEM (Scanning Electron Microscopy).

並列關鍵字

Holographic inference and Photolithography ； soft printing ； microcontact printing

參考文獻

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