混和氫氣、氬氣或氮氣於乙炔中對電漿輔助化學氣相法沉積類鑽碳膜之機械與耐磨耗特性的影響

本實驗以電漿輔助化學氣相沉積系統在矽基材上沉積類鑽碳膜，在沉積的過程中，固定相同的時間，以乙炔混合氫氣、氬氣與氮氣，依不同的流量比，探討在不同氣氛下沉積類鑽碳膜，分別以表面輪廓儀量測膜厚、原子力顯微鏡量測碳膜表面粗糙度、拉曼光譜儀分析碳膜膜結構、奈米壓痕量測碳膜硬度、菲佐干涉儀量測膜內壓應力與磨耗試驗機量測耐磨耗性質。實驗結果顯示隨摻雜氫氣、氬氣與氮氣的增加，碳膜的厚度隨之下降，氫氣的蝕刻效應比氬氣與氮氣來的明顯。隨著氫氣、氬氣與氮氣含量的增加，皆有助於表面粗糙度的下降，摻雜氫氣一樣具有比氬氣與氮氣更平滑的表面。膜內結構皆會隨著氣體含量的增加，sp2 相對於sp3 的結構比例增加，顯示碳膜內結構有可能往類石墨結構發展。隨氫氣與氬氣含量的增加有助於膜內硬度上升，氮氣部分硬度反而下降，有可能在沉積過程中氮氣轟擊碳膜使膜內sp3 C-C 鍵結被打斷，使膜內硬度下降。膜內壓應力隨氬氣與氮氣含量的增加，膜內應力先是上升加入後下降，顯示氬氣與氮氣皆有可能降低膜內壓應力。磨耗部分氫氣與氬氣含量的增加有助於類鑽碳膜耐磨耗特性，而氮氣無太明顯的影響。

關鍵字

類鑽碳膜；機械性質；磨耗性質；電漿輔助化學氣相沉積法

並列摘要

Diamond-like carbon (DLC) films were deposited on silicon substrate using acetylene as carbon source by RF plasma enhanced chemical vapor deposition (RF-PECVD). Different ratios of acetylene mixed with H2, Ar or N2 and different plasma post-treatment were investigated. The films thickness, surface curvature and microstructure of DLC films were characterized by Alpha-Step profilometer, Fizeau interferometer and Raman spectroscopy, respectively .The surface roughness, hardness and Young’s Modulus were analyzed by atomic force microscopy (AFM) and nano-indentation. The experimental results show that the surface roughness of DLC films decrease with increasing H2/C2H2, Ar/C2H2 or N2/C2H2 ratio. The Raman results indicate that sp2 proportion in DLC films increases when the H2/C2H2, Ar/C2H2 or N2/C2H2 ratio increases. It was found that hardness was raised as the H2/C2H2 or Ar/C2H2 ratio was increased, but decrease of hardness was found when the N2/C2H2 ratio was increased. For the residual stress, addition of H2 were found to raise the residual stress. However, decrease of residual stress was observed for the addition of Ar or N2. The wear properties of DLC films deposited at different H2/C2H2, Ar/C2H2 or N2/C2H2 ratio was studied by using different wear loads and times. The experimental results indicate that the wear properties were improved when acetylene was mixed with H2, Ar or N2. For the Ar or H2 plasma post-treatment, thickness, surface roughness and hardness decreased. For the wear test results, H2 plasma post-treatment was found to improve the wear resistance. Keywords:

並列關鍵字

Diamond-like carbon films ； Mechanical properties ； Wear property ； Plasma enhanced chemical vapor deposition

參考文獻

[1]J. Robertson, “Diamond-like amorphous carbon”, Materials Science and Engineering R 37(2002)129-281.

[3]T. Nakahigashi, Y. Tanaka, K. Miyake, H. Oohara, “Properties of flexible DLC film deposited by amplitude-modulated RF P-CVD”, Tribology International 37 (2004) 907–912.

[4]C. De Martino, F. Demichelis, A. Tagliaferro, “Determination of the sp3/sp2 ratio in a-C:H films by infrared spectrometry analysis”, Diamond and Related Materials 4 (1995) 1210-1215.

[5]J.C. Angus, C.C. Hayman, “Low-Pressure Metastable Growth of Diamond and Diamond like Phases”, science vol. 241 (1988) 913-921.

[6]I. Garnev, V. Orlinov, “Evaluation and parametric modelling of abrasive wear resistance of ion-plated thin DLC films”, Tribology International 37 (2004) 907–912.

國際替代計量

混和氫氣、氬氣或氮氣於乙炔中對電漿輔助化學氣相法沉積類鑽碳膜之機械與耐磨耗特性的影響

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