新型三自由度繞射雷射光學尺系統

A Novel Three-Degree-of-Freedom Diffraction Type Laser Linear Encoder

鄧信豪(Hsin-Hao Teng)

指導教授 ： 覺文郁

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2008年)

摘要

本文提出新型三自由度繞射雷射光學尺系統，優於目前傳統一軸光學尺在量測位移的同時，可再量測出兩個角度誤差。此三自由度量測系統利用偏振干涉原理量測線性位移，並利用自動視準儀原理量測兩個角度，並將此兩個量測系統設計於同一套光學系統內。新型三自由度繞射雷射光學尺系統線性位移解析度為 13.1 nm，角度位移解析度為 0.11 arcsec。本論文利用HP雷射干涉儀與自動視準儀驗證本光學尺的實驗結果，於檢測平台25 mm 行程中，線性位移誤差最大約為 0.16 μm，搖擺度誤差最大約 0.4 arcsec，滾動度誤差最大約 0.41 arcsec。

關鍵字

繞射光柵 ； 光學尺 ； 三自由度

並列摘要

In this study, a three-degrees-of-freedom laser encoder was developed. The measuring principles of linear displacement measurement was based on the diffractive method and polarization interference method. The angle measuring method was the autocollimation method. These optical paths of these two methods are designed in a single optical system. The resolution of linear displacement is 13.1 nm and the angular resolution is 0.11 arcsec.The HP laser interferometer and an autocollimator were used to verify our proposed system. The accuracy of linear displacements is 160 nm and the accuracy of angular measurement is 0.41 arcsec.

並列關鍵字

Diffraction grating ； Diffractive method ； Polarization method ； Laser encoder ； Three-degrees-of-freedom

參考文獻

[1] K. Akiyama and H. Iwaoka(1986), “High resolution digital diffraction grating scale encoder.” U.S. Patent No.4,629,886.

[2] Takamasa, S., Osami, S., and Takeo, M. (1989), “Phase locked laser diode interferometry for surface profile measurement,” Appl. Opt.,28(20), 4407-4410.

[3] S. Ishii, T. Nishimura, K. Ishizuka and M. Tsukiji(1990), “Optical type encoder including diffraction grating for producing interference fringes that are processed to measure displacement.” U.S. Patent No.4,912,320

[4] W.F.N. Stephens(1990), “Opto-electonic scale-reading apparatus,” U.S. Patent No.4,959,542.

[5] Osami, S., Kazuhide, T., and Takamasa, S. (1990), “Sinusoidal phase modulating laser diode interferometer with a feedback control system to eliminate external disturbance,”Opt. Eng., 29(12),1511-1515.