在實驗的過程中會利用光學全像干涉微影(Holographic Interference Lithography) 技術和黃光微影製程(Photolithography)等來完成,在結構中會做出D型的光纖結構,並利用研磨技術完成D型光纖結構的表面研磨,最後再利用二甲基矽氧烷(polydimethysiloxane,PDMS)的材料特性並使用微成型方式來製作出表面浮雕光纖光柵。 過程上,以單模光纖特製研磨試片來進行單邊研磨(Side-Polished)。反覆的研磨拋光動作搭配光學顯微鏡的觀察,可以確認光纖逐漸趨近光纖核心直到纖蕊為止,接著進行黃光微影製程與光學全像干涉微影系統,來製作繞射光柵濾波元件;利用旋轉塗怖正光阻,將短週期布拉格光柵表面光柵曝光於光纖平面一側,當確認光柵表面完整之後,塗怖PDMS材料與光柵表面用來轉印細微的繞射光結構,接著利用高分子材料溶解光阻劑於PDMS與光纖表面組成的微流通道內,當光阻劑犧牲層被取代後曝光高分子材料,最後可觀察元件之光學反應級特性。 此實驗中以微成型技術成功替換掉光柵本身的材料,製做出光纖表面布拉格光柵,其光柵的深度與週期可由原子力顯微鏡(AFM)觀察,光學傳輸特性可由ASE寬頻光源與光纖極化器利用光頻譜分析儀(OSA)等測量與紀錄實驗知結果,並且加以做研究之討論。
We proposed a method for fabricating D-shaped optical fiber by polishing the surface on the fiber. After, utilizes the photolithography and holographic interference lithography technologies, which fabricated the Bragg surface grating on the D-shaped fiber. Next, we can using micro-molding process to fabricating surface-relief fiber grating by the special material (polydimethysiloxane, PDMS). During the fabrication, we first make some polishing samples to do side-polished on multi-mode fiber. It would precisely stop polishing until reaching the core of fiber. Next, we conduct to fabricate on diffraction grating filter component through photolithography process and holography interference lithography, and then it utilizes spinner to spin coating and expose the positive photoresist on core of fiber with short periodic Bragg surface grating. Moreover, and utilizes polymer to dissolution the photoresist in microchannel. After the sacrificial layer dissolution of photoresist by polymer, exposes the polymer material. Next, observed and analyzed its optical reactive features. In the last, the aim of the research was to change the material for grating, to fabricate the fiber surface Bragg diffraction grating by micro-molding process. Its period and depth of grating is observed by atomic force microscope(AFM).