以單模D型光纖製作雙波長濾波元件

Fabrication of Dual-Wavelength Filter by Using D-Shaped Single Mode Fibers

鍾冠倫(Gua-Nlun Chung)

指導教授 ： 莊為群

國立虎尾科技大學/電機資訊學院/光電工程系光電與材料科技碩士班/碩士(2016年)

摘要

本文以單模D型光纖為主要元件，光纖有著低損耗、抗電磁的干擾性強、高敏感度的特性，研究中先將光纖固定在凸型結構上，再以SLD(Superliminescent Diode)寬頻光源及光功率感測器的功率變化來觀察光纖研磨的深度取得D型光纖。
再利用光纖對光的靈敏度，搭配上光纖布拉格光柵(Fiber Bragg Grating,FBG)來製作濾波元件，研究中光纖布拉格光柵FBG將以光學全像干涉微影技術(Holographic Interferometry Lithography)與黃光微影技術(Photolithography)將光柵形成在PDMS(Polydimethysiloxane)上，再把有著FBG的PDMS覆蓋在D型光纖上進行耦合製成一個簡易濾波元件。
在研究中，將以原子力顯微鏡(Atomic Force Microscope，AFM)觀察光柵週期以及深度，再用光譜分析儀(Optical Spectrum Analysis,OSA)來進行光纖波長的觀察量記與記錄，再進行探討。

關鍵字

D型光纖 ； 光學全像干涉微影技術 ； 布拉格光柵

並列摘要

In this paper, single-mode fiber optic D as the main component, has a low-loss optical fiber, anti-electromagnetic interference is strong, characteristic of high sensitivity, the study first optical fiber is fixed to the convex structure, then SLD (Superliminescent Diode) broadband light source and power variation optical power sensors to observe the depth of the fiber polishing made D-type fiber.
Recycling fiber sensitivity to light, with the fiber Bragg grating (Fiber Bragg Grating, FBG) to produce filter elements, the study will be an optical fiber Bragg grating FBG holographic interference lithography (Holographic Interferometry Lithography) and photolithography technique ( Photolithography) grating formed in the H-PDMS (Hard-Polydimethysiloxane) on, then the H-PDMS has FBG cover coupled into a simple filter element in the D-type fiber.
In this study, we will AFM (Atomic Force Microscope, AFM) observation and depth of the grating period, and then an optical spectrum analyzer (Optical Spectrum Analysis, OSA) to observe and record the amount of recording wavelength of the optical fiber, and then discuss.

並列關鍵字

D-type fiber ； optical holographic interference lithography ； Bragg grating

參考文獻

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