基於光刺激發光技術用於Al2O3:C材料之劑量消光研究

Optical Bleach For Dosimetry in Al2O3:C Base On Optically Stimulated Luminescence Technique

李勁吾(Jing-Wu Li)

指導教授 ： 謝奇文

國立交通大學/理學院/電子物理系所/碩士(2009年)

https://doi.org/10.6842/NCTU.2009.00815

摘要

為了解決Al2O3:C材料在同一光激發螢光強度下對應兩個高低不同的輻射劑量值問題，本文嘗試使用部分光清除方法，得到在相同照射時間下光激發螢光強度有不同的下降速率，於是高低兩個值分開。

實驗上利用可見光和紫外光作為光清除燈源，發現紫外光有清除能力但也有累積劑量的效果。

理論上利用了能帶理論模擬電子在Al2O3:C材料中的光清除行為，和最大光清除效果。模擬結果和實驗值比對，進而以此數學模型預測激發光源調變後材料Al2O3:C的發光行為變化。

關鍵字

光刺激發光 ； 光清除 ； 輻射劑量測量學

並列摘要

An optical bleach system was designed to deal with a puzzle where one of OSL intensity in Al2O3:C indicating two different amounts of doses. After the optical bleach, a different OSL decay speed was discovered to separate those two doses. This research helps in the emergency management of nuclear accident or high radiation exposure event.

Experimentally, visible light and ultraviolet light was used as the bleach light source. UV was discovered with anti-bleach property. Therefore, a flexible UV thin film filter was set in the visible light bleach system.

Furthermore, a dynamic band theorem simulation was used to describe electron property inside the Al2O3:C. Optical bleach simulation and maximum bleach simulation match the experimental data successfully. The model can not only predict the optical bleach effect but also the OSL signal variance by changing excitation photon energy.

並列關鍵字

Optically Stimulated Luminescence ； Optical Bleach ； Radiation Dosimetry

參考文獻

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