透過您的圖書館登入
IP:18.117.196.217
  • 學位論文

沸石/高分子奈米複合薄膜之製備與特性研究

The Study of Zeolite/Polymer Nanocomposite Thin Films and Their Properties

指導教授 : 林炯芳

摘要


本文提出製備沸石複合薄膜的一種簡單製程,由Silicalite-1 和PAA 依最佳比例混合成奈米懸浮液,再藉由本實驗室自行設計的氣霧沉積系統來製備沸石/聚酰亞胺複合薄膜;藉由調整製程參數(基板溫度、主空氣流量、輔助空氣流量、鍍膜時間)來獲得品質最佳的複合薄膜,再藉由XRD、FT-IR、BET、SEM、TEM、AFM、接觸角等儀器分析薄膜性質。 結果顯示本論文成功製備出奈米沸石複合薄膜,本系統鍍膜能在沉積薄膜同時去除模板,相較於旋轉塗佈法在薄膜製備完後須經過高溫煅燒後才能去除模板,且過程中非常容易使薄膜產生裂縫,所以本系統具有避免在煅燒時使薄膜產生裂縫的優點。 Silicalite-1 沸石和一般低介電材料所用矽材(SiCOH..等)相比,具有較高的比表面積和機械強度,但因其表面SiOH 造成部分親水性及顆粒附著力差因而限制其應用,許多研究為了將其應用在低介電常數材料上,以許多繁複的改質方法雖能獲得更佳薄膜,但也限制其商業潛力。本論文以Silicalite-1 與PAA 奈米懸浮液混合並以氣霧沉積系統製備複合薄膜,不但製程簡單,疏水性及附著力及平整度均達到一定水準,同時也具有低的介電常數(k=2.17),使其更具應用價值。

並列摘要


In this study, a simple fabrication of zeolite nanocomposite thin films, deposited by vaporizing a mixing Silicalite-1 and PAA suspension to a set ratio, were prepared by our self-designed liquid spray system. Investigated the effects of the operating parameters such as the heating temperature on substrate, the rates of the main air, auxiliary air flow and deposition time, could prepared the good quality nanocomposite films. The crystalline, surface morphology, and chemical composition of prepared samples would performed by the instruments of XRD, FT-IR, BET, TGA, SEM, TEM ,AFM and Constant Angle Meter. The result showed that zeolite nanocomposite thin films deposited by our system is success and also remove the template agents simultaneously. Compared with spin-coating method ,need to remove the template agents under high-temperature calcinations and therefore difficult to avoid the film cracks. Many researches hoped to develop Silicalite-1 membrane as low-k materials as it has good mechanical strength and high porosity more than traditional silicon material. However, the adhesion and hydrophobicity far worse compared of colloids such as macromolecules, the problem mentioned have to effectively solved in order to the commercialize stage. Based on the above fabricating, our zeolite thin films having higher adhesion and hydrophobicity and good flatness, also owned a low dielectric constant (k= 2.17), it shows more potential commerical development is to be expected.

參考文獻


[1] Breck D.W., “Zeolite molecular sieves”, John Wiley & Sons, Inc, 1974.
[3] Flanigen E.M.“Molecular Sieve zeolite Technology-The First twenty-five-years.”Pure& apply ,vol.52, pp.2191-2211, 1980 .
[6] Lew C.M., Cai R., & Yan Y., “Zeolite thin films: from computer chips to space stations”, Accounts of chemical research, 43(2), 210-219, 2009.
[8] Liu R., Pai C.S., & Martinez E., “Interconnect technology trend for microelectronics”, Solid-State Electronics, 43(6), 1003-1009, 1999.
[9] Volksen W., Miller R.D., & Dubois G., “Low dielectric constant materials”, Chemical reviews, 110(1), 56-110, 2009.

延伸閱讀