化學氣相沉積鑽石薄膜經氫氣與氧氣電漿處理之磨耗與腐蝕性質

本論文研究以熱燈絲化學氣相沈積法，在矽基板上合成鑽石薄膜，並於製程中添加氫氣與氧氣以探討這兩種氣體的添加對鑽石薄膜磨耗與腐蝕性質之影響效應。首先利用拉曼光譜儀、X光繞射、奈米壓痕分析儀、原子力顯微鏡等薄膜結構分析方法，對各種鑽石薄膜之原子鍵結、結構、與表面形態做一分析與討論，將鑽石鍍膜試片與AISI 4140鋼對磨環，以塊對環(block-on-ring)摩擦方式，施以不同荷重測試鍍膜之耐磨耗性質；以及在1M H2SO4 + 1M NaCl溶液中，量測腐蝕電位，並利用電化學線性極化方法分析鍍膜對於腐蝕極化阻抗與腐蝕電流之優劣。研究結果發現，鑽石薄膜在H2添加的情況下，代表鑽石相的sp^3會較為明顯，使硬度增加及鍍膜表面組織致密性較好，對於耐磨耗與抗腐蝕性質有提昇的作用，而O2的添加使sp^2增加、sp^3降低，相對於抗腐蝕與耐磨耗性質都有降低的趨勢。

關鍵字

熱燈絲化學氣相沉積法；拉曼光譜儀； X光繞射；奈米壓痕分析儀

並列摘要

The diamond film was deposited on silicon substrate by using a hot filament chemical vapor deposition technique (HFCVD), the H2 and O2 plasma were also added during the final deposition processing. The purpose of this study is to evaluate the effect of H2 and O2 plasma treatments on the corrosion and dry wear resistance properties of the diamond films on silicon substrate. The atomic bonding types, structures, and surface morphologies of various diamond films were analyzed by Raman spectrometer, X-ray diffraction (XRD), and atomic force microscopy (AFM). Furthermore, the mechanical properties of diamond films were tested by a precision nano-indentation test instrument. The corrosion resistance of diamond films were measured in 1M H2SO4 + 1M NaCl solution by using linear polarization technique. The experimental results indicated that the diamond film under H2 plasma addition possessed dense surface and obvious diamond phase of sp^3 bonding, increasing the hardness and improving the surface structure, consequently, increasing corrosion and dry wear resistance properties. However, the diamond film under O2 plasma addition resulted in a more sp^2 and less sp^3 bonding, corresponding to the decreases of the corrosion and dry wear resistance.

並列關鍵字

hot filament chemical vapor deposition ； Raman spectrometer ； X-ray diffraction ； nano-indentation

國際替代計量

化學氣相沉積鑽石薄膜經氫氣與氧氣電漿處理之磨耗與腐蝕性質

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