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  • 學位論文

以直流磁控濺鍍氮化鈦薄膜於AZ31鎂合金之最適化製程

The Optimum Processes of TiN Films Deposited on AZ31 Magnesium Alloys by DC Magnetron Sputtering

指導教授 : 程金保
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摘要


鎂合金的密度為1.74 g/cm3,為輕金屬結構最輕者。然而,鎂有高腐蝕電流的趨勢,在工業上鎂則有高溫低強度及較差抗磨損能力之不利條件。由過去的研究結果顯示,經由物理汽相沉積(PVD)技術沉積薄膜可以克服上述缺點,加上氮化鈦具有高硬度、耐磨耗、抗腐蝕等特點,所以本研究係以直流式非平衡磁控濺鍍系統,將氮化鈦薄膜沉積在AZ31鎂合金上。本實驗採用L9直交表所配置的參數有基板溫度、靶材電流、負偏壓、及試片至靶材的距離等,製備後的試片則以X光繞射檢測薄膜晶體結構,以SEM觀察薄膜橫斷面形貌,以α-step量測薄膜厚度,以維克氏硬度儀量測硬度,以原子力顯微鏡量測表面粗糙度,以洛氏壓痕試驗及刮痕試驗來鑑定薄膜附著性。 從實驗結果顯示:氮化鈦薄膜的優選方向為(111)、硬度值分佈由1242.99至1761.74 Hv,粗糙度值分佈由1.526至4.352 nm,在洛氏壓痕實驗得知氮化鈦薄膜沉積在鎂合金上有不錯的附著性,以試片S5為例進行刮痕試驗,得其附著力為10 N。同時,本研究以田口方法針對薄膜沉積速率、硬度及表面粗糙度等品質特性進行分析,得其沉積速率最適化參數為:基材溫度110℃、靶材電流0.7A、負偏壓50V、試片距離110mm;硬度最適化參數為:基板溫度110℃、靶材電流0.5A、負偏壓100V、試片距離150mm;表面粗糙度最適化參數為:基板溫度150℃、靶材電流0.5A、負偏壓50V、試片距離150mm。

關鍵字

氮化鈦 濺鍍 鎂合金

並列摘要


Magnesium alloys is one of the lightest construction metals with a density of 1.74 g/cm3. However, Mg alloys has a high tendency to galvanic corrosion. Other disadvantages in industrial of Mg alloys are low strength at elevated temperatures and poor wear resistance. Based on the previous studies, the deposition of coatings via physical vapor deposition (PVD) technologies seems to overcome these drawbacks. Besides, TiN thin films have excellent hardness; good wear resistance, and high corrosion resistance. Therefore, this study to deposited titanium nitride (TiN) thin films on AZ31 magnesium alloys using DC unbalance magnetron (UBM) sputtering system. The parameters used L9 orthogonal array, including temperature of substrate, current of target, negative bias, and specimen-target distance. After deposition, the thin film structure was characterized by X-ray diffraction (XRD), and the cross-section was observed by scanning electron microscopy (SEM). The thickness of TiN films was measured by alpha-step. The hardness of thin film was measured by Vickers test. The roughness of thin film was determined by atomic force microscopy (AFM). The adhesion of thin film was measured by Rock-Well indentation test and scratch test. The results showed that TiN films has (111) preferred orientation. The hardness of those films is from 1242.99 to 1761.74 Hv. The roughness of those films is from 1.526 to 4.352 nm. And from Rock-Well indentation test showed the TiN films deposited on magnesium alloys has a good adhesion. Take S5 for example, it shows that the adhesion is about 10N on scratch test. At the same time, those thin films in order to find out the parameters of optimum conditions were analyzed by Taguchi method on quality characteristic like the deposition rate, hardness and roughness. From the statistical analysis, the optimum conditions for the maximum deposition rate are : temperature = 110℃, current = 0.7A, negative bias = 100V, and specimen-target distance = 110mm. The optimum conditions for the maximum hardness are : temperature = 110℃, current = 0.5A, negative bias = 100V, and specimen-target distance = 150mm. The optimum conditions for the minimum roughness are : temperature = 150℃, current = 0.5A, negative bias = 50V, and specimen-target distance = 150mm.

並列關鍵字

titanium nitride sputter magnesium alloy

參考文獻


9. Frank Hollstein, Renate Wiedemann, and Jana
51. W. K. Grant, C. Loomis, J. J. Moore, D. L. Olson, B.
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