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  • 學位論文

以HPDMS轉印複製製程在D 型光纖上製作高解析度週期結構

Fabrication of high resolution periodical structure on D-shaped optical fiber by using a HPDMS replication method

指導教授 : 何智廷
共同指導教授 : 李安謙
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摘要


本研究提出D 型光纖的研磨技術,並結合黃光微影製程(Photolithography)、光學全像術干涉微影(Holographic Interference Lithography)技術、微模轉印技術,製作出D 型光纖布拉格表面光柵濾波元件。 首先以多模光纖製作成研磨試片後,進行試片單邊研磨(Side-Polished),其精確的研磨拋光直到光纖纖芯為止。下一步進行黃光微影製程與光學全像干涉微影技術,來製作繞射光柵濾波元件;利用旋轉塗佈正光阻,將短週期布拉格表面光柵曝光於玻璃基板上,並且利用HPDMS材料轉印其光柵特徵結構。 最後我們將以微模轉印技術,將光柵特徵精確複製於光纖研磨面上 。研究中我們將可完成製作出以微模轉印複製之D型光纖光柵濾波元件,其光柵週期與深度可由原子力顯微鏡(AFM)觀察,及光學傳輸特性可由ASE寬頻光源與光纖極化器利用光頻譜分析儀(OSA)等測量與紀錄實驗之結果。

關鍵字

D型光纖 光柵 轉印製程

並列摘要


In this project, we proposed a method to fabricate a D-shaped optical fiber of Bragg surface grating filter component by D-shaped fiber polishing along with photolithography、holographic interference lithography technologies and micro-molding process. First , we will do side-polished on multi-mode fiber. It will precisely stop polishing until it reaches the core of fiber. Next, we will fabricate the diffraction grating filter component through photolithography process and holography interference lithography. It utilizes spinner to spin coating photoresister , and then the positive photoresist with periodic Bragg surface grating will be fabricated on glass substrate and then the diffraction grating element will he transferred to the D-shaped fibers by using HPDMS as the transfer mold. Finally, we accurately reproduce the characteristics of the grating on the surface of optical fiber by using micro-molding process. By this method, we can fabricate a low loss transmission whole fibered D-shaped optical fiber grating filter. Its period and depth of grating is observed by atomic force microscope (AFM), and the results of optical transmission characteristics are measured and shown by ASE broadband light source and in-line optical fiber polarizer though optical spectrum analyzer(OSA).

參考文獻


[1] Nisihhara. H., Y.Handa, T. Suhara, and J. Koyama, “Electron-beam directly written micro gratings for integrated optical circuits,” Proc. SPIE, 239:134, 1980.
[2] Y. Cheng, T. Huang, C.-C. Chieng, “Thick-film lithography using laser write,” Microsystem Technologies 9 (2002) 17–22 _ Springer-Verlag, 2002.
[5] Blodgett K. B., 1939, “Use of Interference to Extinguish Reflection of Light From Glass”, Phy. Rev.55, 391.
[6] Schmahl. G., and D.Rudolph, “Holographic diffraction grating,” In: Progress in Optics, E.Wolf, ed., North-Holland, Amsterdam, 14, pp.195, 1976.
[8] K.O.Hill and Gerald Meltz, “Fiber Bragg Grating Technology Fundamentals and Overview,” J.Lightwave Technol., 15(8), p.1263, 1997.

被引用紀錄


林聖凱(2011)。以微壓印製程在D型光纖上製作布拉格光柵〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-0107201110521700
陳皇志(2014)。以聚焦離子束寫製法與微模轉印製程在D型光纖上製作布拉格光柵〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-0107201403372700

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