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真空熱壓燒結壓力對Cr-60 wt% Si合金顯微組織與材料特性之研究

Effect of Vacuum Hot-Press Sintering Pressure on the Microstructures and Material Characteristics of Cr-60 wt% Si alloys

摘要


鉻矽合金廣泛地使用於濺鍍靶材,而由於鉻矽薄膜在電性方面有著優良的性質,像是低溫度電阻係數(Temperature Coefficient of Resistance,TCR)、高的熱阻抗及長期的穩定性等,因此在微電子領域的應用相當廣泛。此外,真空熱壓燒結是一種結合傳統燒結與加壓成形的複合式粉末冶金技術,在熱壓過程中,透過石墨模具直接將壓力傳遞至粉末,同時進行材料的壓製與燒結,此方法有助於在相對較低的燒結溫度下,形成較緻密的材料。本研究是在1200℃之燒結溫度下進行熱壓壓力之改變(20、35與50 MPa),對Cr-60 wt% Si合金進行真空熱壓燒結,並對其進行一連串的分析討論。實驗結果顯示,最佳的參數為燒結溫度1200℃、壓力50 MPa及持壓時間1小時,此製程所生產之Cr-60 wt% Si合金具有適當之機械性質與最佳的電導率,其燒結密度增加至4.07g.cm^(-3),硬度和橫向破裂強度分別為82.7 HR30N及84.99 MPa,而電導率為1.67×10^4 S.m^(-1)。

並列摘要


Cr-Si alloys have been widely used in sputtering targets due to their excellent properties, such as low temperature coefficient of resistance, high thermal stability and good long-term reliability. We conducted hot-press sintering experiments at temperature 1,200°C under a series of hot-press pressures 20, 35, and 50 MPa for Cr-60 wt % Si alloys. We investigated the differences in microstructures and characteristics of the Cr-60 wt % Si alloys. Our experimental results showed that the optimal hot-press pressure was 50 MPa and hot-press time one hour. The Cr-60 wt % Si alloys possessed the appropriate mechanical properties and the best electrical conductivity with sintering density 4.07 g.cm^(-3), hardness 82.7 HR30N, TRS 84.99 MPa, and electrical conductivity 11.67×10^4 S.m^(-1).

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