CrN/Cr (N,O)複合鍍膜之製程與特性研究

Study on Process and Characteristics of CrN/Cr (N, O) Duplex Coatings

許正勳(C. H. Hsu) ； 黃東浩(T. H. Huang) ； 何偉友(W. Y. Ho)

《材料科學與工程》 37卷1期 (2005/03) Pp. 1-7

https://doi.org/10.6409/JMSE.200503.0001

摘要

CrN鍍層雖具有高硬度、高溫抗氧化性、低摩擦係數、耐蝕及耐磨耗等特性，但在應用上仍因單層型態而有所限制。本研究目的乃利用陰極電弧沈積(Cathodic Arc Evaporation, CEA)之鍍層披覆技術，變化沈積時間及O2/N2分壓比來披覆CrN/Cr (N, O)複合鍍層在SKD11模具鋼上，探討是否能藉由製程參數之變化來改善CrN的硬度，又兼具耐腐蝕、脫模性佳等特性。
實驗結果顯示，隨著CrN/Cr (N, O)複合膜層之沈積時間增加，其硬度值高達30GPa以上：而O2/N2比例不論爲0.5或2時，其硬度值也都高達20GPa以上；在磨耗性質測試中發現所有CrN/Cr (N, O)複合膜層的試片，其磨擦係數大約爲0.4；O2/N2比例爲0.5時，其摩擦係數也在0.3-0.4之間。由此可知，CrN/Cr (N, O)複合膜層可明顯地降低CrN的摩擦係數(0.6)；此外，由水接觸角實驗得知其脫模性也較CrN來得佳。

關鍵字

陰極電弧沈積 ； CrN/Cr(N, O)複合膜 ； 硬度 ； 摩擦係數 ； 脫模性

並列摘要

Chromium nitride (CrN) film possesses high hardness, oxidation resistance at high temperature, low friction coefficient, excellent corrosion and wear resistance properties. However, due to the morphology of single layer, there are still some limits for applications. In this study, PVD cathodic arc evaporation (CAE) sputtering technique was mainly utilized to deposit and synthesize CrN/Cr (N,O) duplex coatings on SKD11 molding material for potential applications. It was expected that various process parameters (such as depositing time, O2/N2 ratio) were changed to improve hardness, immersible corrosion and release properties of CrN coating.
The experimental results showed that the hardness was above 30GPa with increasing of the depositing time. The ratio of O2/N2 at 0.5 and 2, respectively, the hardness of both conditions could reach the value of 20GPa. On tribological testing, the friction coefficient of al CrN/Cr (N, O) duplex coatings was 0.4, approximately. When ratio of O2/N2 at 0.5, the friction coefficient was between 0.3 and 0.4, and lower than that of CrN(0.6). In addition, it was found that release property of the CrN/Cr (N, O) duplex coatings was better than that of CrN coating.

並列關鍵字

Cathodic arc evaporation ； CrN/Cr(N, O) duplex coatings ； Hardness ； Friction coefficient ； Release property