透明導電氧化物薄膜技術現況與發展

Developments of Processing Techniques and Properties of Transparent Conductive Oxide Films

駱榮富(R. F. Louh) ； 吳忠衛(William Wu) ； 劉于菁(Jean Liu)

《真空科技》 22卷3期 (2009/09) Pp. 39-53

https://doi.org/10.29808/JVSROC.200909.0007

摘要

透明導電氧化物(TCO)迄今已半世紀以上的使用記錄，現在更是大量地應用於平面顯示器、太陽能電池、汽車及建築物玻璃等。本文旨在回顧目前TCO薄膜的光電特性和當前一些重要的研究焦點，並指出所需選擇的材料、低溫製程參數、設計光學多層膜等方面，以提高透明導電膜的綜合性能，例如高品質商用ITO薄膜期能在可見光波長區域的平均透光率能夠達到95%以上，以滿足高尖端技術的需求。TCO材料發展初期比較偏重於實用性的開發，而近年來因為材料科技長足的進步，各研究團隊對其各項物性已有相當深入的掌握。

關鍵字

透明導電薄膜TCO ； 氧化銦錫ITO ； 氧化銦In2O3 ； 氧化錫SnO2 ； 氧化鋅ZnO

並列摘要

Transparent conductive oxide (TCO) thin films came in practical uses such as flat panel displays, photovoltaics, automobile and building windows for several decades. In this article, the electrical and optical properties of TCO films as well as the contemporary research highlight of TCO films, in particular, the emphases on the materials selection, the modification of low-temperature process conditions, design of multilayer optical films in order to the meet every technical need to high quality commercial applications of TCO films with lower resistivity and high transmittance greater than 95%. Since the early development stage of TCO films stressed on the practical aspects, the continuous exploration of sophisticated processing techniques are proposed for a number of novel applications due to the fact that a better understanding on improvement of material properties are conceived.