射頻磁控濺鍍製備WO_3/Ag/W/WO_3多層膜之研究

本研究以射頻磁控反應性濺鍍系統，在常溫下製鍍WO_3/Ag/W/WO_3（WAWW）薄膜於B270玻璃基板上，探討鎢薄膜厚度對於多層膜之電性及光學性質之變化。並且以該多層膜為基礎，配合Essential Macleod光學軟體模擬設計及製備出WAWW 7層多層膜，探討其電致變色及光學性質特性之研究。實驗中，薄膜厚度以橢圓偏光儀及Complete EASE程式分析量測，以電子顯微鏡能量散佈分析儀分析薄膜成分，以四點探針量測薄膜的電阻係數及片電阻，再透過電致變色實驗與光譜量測薄膜著色態（colored）與漂白態（bleached）之穿透率。實驗結果發現WAWW多層膜，鎢薄膜厚度須大於2 nm，薄膜片電阻約為4.6Ω/sq，多層膜方具備導電特性。這一層鎢薄膜，主要為防止銀薄膜於後續之WO_3薄膜製程時被氧化。而經光學設計所製備之WO_3（29.46nm）/Ag（14.2nm）/W（2nm）/WO_3（68.58nm）/Ag（16.97nm）/W（2nm）/WO_3（30.4nm）7層多層膜，在漂白態時，可見光波段的平均穿透率為71.5%，在紅外光波段的平均穿透率為9.9%；在著色態時，可見光波段的平均穿透率為23.6%。此該多層薄膜具備電致變色（Electrochromic, EC）特性和導電性，並可作為透明熱鏡之應用。

關鍵字

射頻磁控反應性濺鍍系統；電致變色；著色態；漂白態；熱鏡

並列摘要

In this study, the WO_3/Ag/W/WO_3 (WAWW) films were deposited on the B270 glass substrate with W and Ag targets by radio frequency magnetron reactive sputtering system at room temperature. Effects of thickness of the W layer on the electrical and optical properties of the WAWW films were investigated by ellipsometer, field emission scanning electron microscopy with energy dispersive X-ray spectroscopy, a four-point probe, and a spectrophotometer. It was found that the WAWW films were conductive when the W layer was more than 2 nm. The sheet resistance of WAWW film was 4.6 W/sq as the thickness of the W layer was 2 nm. This thin W layer is used to prevent Ag oxidation during the deposition of the subsequent WO_3 film. The optical design of electrochromic WAWW 7 layers for the hot-mirror application was WO_3(29.46 nm)/Ag(14.2 nm)/W(2 nm)/WO_3(68.58 nm)/Ag(16.97 nm)/W(2 nm)/WO_3(30.4 nm). The average transmittance of bleaching and colored states of WAWW 7 layers in the 400-700 nm range were 71.5% and 23.6%, respectively. In addition, the transmittance of the WAWW 7 layers in the bleached state was 9.9% in the infrared range. The ITO-free of WAWW 7 layers have electrochromic and optical application was confirmed.

並列關鍵字

RF magnetron reactive sputtering system ； Electrochromic ； colored ； bleached ； hot-mirror

國際替代計量

射頻磁控濺鍍製備WO_3/Ag/W/WO_3多層膜之研究

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