奈米球微影術,乃是利用自組裝之方式,在基板上堆疊出六方緊密週期排列奈米球,其可以把奈米球當作類似光阻之遮罩功能,並可藉由選擇奈米球大小來控制其週期尺寸。本研究藉由奈米球微影術之方式,首先在矽晶圓(100)上以旋轉塗佈法堆疊出大面積緊密排列的單層奈米球陣列,再以RF磁控濺鍍法沉積類鑽碳(DLC)膜,以形成二維類鑽碳(2-D DLC)薄膜陣列,此類鑽碳膜陣列經潤濕特性測量,可得最高接觸角為118.63°,相較於未鍍膜之接觸角46.41°,提升了155.6%,明顯提高了疏水特性。緊接著,以反射光譜儀探討類鑽碳膜陣列之光學特性,在可見光波段皆有抗反射效果,其反射率由原本的40~50%下降至1%左右,有效地降低其反射率,可應用在抗反射膜之製作。而在三維光子晶體方面,本研究利用DLC膜成功地製作三維反蛋白石光子晶體結構,並探討三維DLC膜結構反射率與光子能隙(PBG)之現象,發現此三維結構有光學濾波效果,可應用於光學濾光片與光學元件上。最後,將利用奈米球微影技術,經反應式離子蝕刻機(RIE)蝕刻不同粒徑奈米球,控制其Ar/CF4/O2混合氣體流量比例5/5/5 sccm,成功地製作出奈米矽圓柱(Nanocolumns)與奈米矽圓錐(Nanocones)陣列,可應用於太陽能電池、場發射顯示器、場效電晶體與光學元件上。
Nanosphere lithography (NSL) has potential applications in many areas, which uses self-assembled polystyrene (PS) colloidal monolayer as templates. In this study, polystyrene nanoparticles previously were first coated onto silicon wafer (100) to form a layer of hexagonal closed-packaged structure. RF magnetron sputtering then was employed to grow two-dimensional diamond-like carbon (2-D DLC) arrays. The contact angle analysis revealed that the hydrophobic have been significant improved, as increased by 155.6% (118.63°and 46.41° for the 2-D DLC arrays and uncoated Si substrate, respectively). In addition, the reflectance of as-grown 2-D DLC arrays has decreased to 1% and open an great applications potential in anti-reflectance (AR) coating. Moreover, three-dimensional (3-D) photonic crystal was successfully produced through using DLC films to fabricate three-dimensional inverse opal structures. Optical properties of those 3-D photonic crystals were investigated, and high reflectance of 3-D DLC inverse opal was obtained. Besides, we have developed a novel method to produce vertical arrays silicon nanocolumns and nanocones by NSL and etching with Ar/CF4/O2 gases mixture ratio 5/5/5 sccm. The results indeed open up avenues for applications in solar cells, field emission, and optical devices.