壓電式CMOS MEMS 噴墨頭之研究

A Study of CMOS MEMS Piezoelectric Inkjet Head

李志程(Chih-Cheng Lee)

指導教授 ： 黃榮堂 ； 施勝雄

國立臺北科技大學/機電學院/機電整合研究所/碩士(2007年)

摘要

本論文是以CMOS標準製程與微機電後製程研製壓電式奈米液滴產生器，主要分為兩部分，第一部份為微流道與微小噴嘴的產生，是以CMOS之氧化層與金屬層設計當遮罩構成主體，並以CMOS MEMS製造接近次微米級噴嘴孔以及噴墨頭腔體流道；CMOS MEMS製程作出潛埋式回流抑制微流道、壓力腔體以及入墨腔體，完成晶片腔體流道及噴孔整體，第二部分為以微電鑄結合新式壓電沈積法—氣膠沈積法來研製致動器，並以CFDRC壓電模組與ANSYS相互驗證分析設計之可行性；探討真空下快速熱退火壓電材料之介電損失與介電常數。最後將壓電致動器以光罩對準儀對準黏接至CMOS晶片上，完成各個獨立的奈米液滴壓電噴嘴頭結構。本研究可加入CMOS驅動波型產生器之電路，以達到單晶片整合系統(monolithic chip integrated system) 之奈米液滴壓電噴嘴頭。

關鍵字

CMOS ； 微機電 ； CFD-RC ； 噴墨

並列摘要

In this thesis, we present a novel fabrication process of nano-droplet generator and micro-nozzle by CMOS process with post-process technique of MEMS. This generator includes two sections：First, we use oxide layers and metal layers to structure main body which was etched to release micro channels, cavities and holes. Furthermore, CMOS MEMS process produces the backflow control channel, pressure chamber and inlet cavity. Second, micro electroforming was combined with newly piezo-material deposition method, namely Aerosol deposition method, to compose the actuator. Therefore, in this research, we use ANSYS to inspect the feasibility of CFDRC. We analyzed the dielectric loss and dielectric constant of piezoelectric material with rapid thermal annealing in the vacuum condition. Finally, the droplet generator is composed of the CMOS chip and actuator after aligning and bonding with mask-aligner apparatus. In the future, we perhaps insert the driving-wave generator of CMOS circuitry to achieve monolithic chip integrated system.

並列關鍵字

CMOS ； MEMS ； CFD-RC ； inkjet

參考文獻

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