真空燒結與熱均壓處理對鎳鉻合金靶材微結構及其性質之影響

鎳鉻(Ni-Cr)合金作為結構和元件材料的應用優勢，已經確立了數十年；此外，他們的高耐腐蝕性，在機械零件的生產和航太上的應用，被認為是一個重要因素。另一方面，Ni-Cr薄膜有較高電阻率，低溫度電阻係數，以及優越的抗黏著性；所以，不同成份比的Ni-Cr合金靶材，被廣泛應用在濺鍍薄膜、微電子元件，平面顯示器與光儲存媒體材料。以往純金屬與合金靶材通常以熔煉鑄造方式製作，然而鎳鉻合金靶材以熔煉方式製造時容易產生成份偏析、微結構不均勻與多孔性等缺陷，即使後續經熱處理或熱加工，亦無法將缺陷完全去除。因此，本研究利用粉末冶金之真空燒結(Vacuum Sintering)與熱均壓(HIP)的粉末冶金方式，製備鎳鉻合金靶材，並藉由進行一系列的實驗測試，以探討不同粉末冶金製程對鎳鉻合金靶材性質之影響。實驗結果顯示，Ni50Cr50合金靶材在經過1345°C真空燒結後，其相對密度達到98.67%，視孔隙率減少至2.52%，抗折強度增加至454.29 MPa。此外，經過1260°C 175 MPa 4 hours熱均壓處理後，Ni50Cr50燒結合金靶材之相對密度達到99.73%，視孔隙率降低至0.3%，抗折強度提高至1181.4 MPa，此一結果顯示利用熱均壓處理能有效消除靶材內部封閉孔隙及改善機械性質，並獲得高緻密度與高性質之鎳鉻合金靶材。

關鍵字

鎳鉻合金靶材；真空燒結；熱均壓；粉末冶金

並列摘要

The advantages of the application of nickel-chromium (Ni-Cr) alloys as structural and device materials have been recognized for decades. Moreover, their high corrosion resistance are considered important factors in the production of machine parts and aerospace applications. On the other hand, Ni-Cr film has a higher resistivity, low temperature coefficient of resistance, as well as excellent anti-adhesion properties. Therefore, various compositions of the Ni-Cr alloy target have been widely used in the sputtering of thin films, micro-electro components, panel display boards and optical storage media materials. In past years, pure metal and alloy targets have usually been made by the melting and casting methods. However, ingredient segregation, non-uniform microstructure and porosity defects in Ni-Cr alloy targets are frequently produced by the melting processes, which subsequent heat treatment and the hot-working process are not able to completely eliminate. Therefore, this study produced Ni-Cr alloy targets via the vacuum sintering and hot isostatic pressing (HIP) techniques of powder metallurgy technology. Moreover, we carried out a series of experimental tests to explore the characteristics and effects of different powder metallurgy processes on the Ni-Cr alloy targets. The experimental results showed that the relative density of Ni50Cr50 alloy targets reached 98.67%, apparent porosity decreased to 2.52% and TRS increased to 454.29 MPa after 1345°C sintering for 1 h. In addition, the relative density increased to 99.73%, apparent porosity decreased to 0.3% and TRS was obviously enhanced to 1181.4 MPa after 1260°C 175 MPa 4 h HIP treatment. This study showed that the HIP process effectively eliminated any internal pores and improved the mechanical property of the sintered Ni-Cr alloy targets, thus obtaining the high density and optimum properties of the sintered materials.

並列關鍵字

Ni-Cr alloy targets ； Vacuum Sintering ； HIP ； Powder Metallurgy

參考文獻

[59] 陳思宏，真空燒結與熱均壓製程對鉻銅合金靶材微結構及其性質之影響

[1] M. A. Angadi and R. Whiting, "Longitudinal and transverse strain sensitivity of nichrome films," Materials Science and Engineering B, vol. 7, Issue 1-2, 1990, pp. L1-L4.

[3] P. Kayser, J.C. Godefroy and L. Leca, "High-temperature thin-film strain gauges," Sensors and Actuasors A, vol. 37-38, 1993, pp. 328-332.

[4] Y. Yao, Xipeng Xu and D. Zuo, "Investigation on Strain Films in the Thin Film Resistance Strain Gauge," Key Engineering Materials, vol. 375-376, 2008, pp. 690-694.

[6] A. A. Al-Aql, "Electrical resistivity measurements in Ni–Cr alloys," Materials & Design, vol. 32, Issue 7, 2003, pp. 547-550.

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真空燒結與熱均壓處理對鎳鉻合金靶材微結構及其性質之影響

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