奈米壓印製程參數分析

The research of the manufacturing parameters in Nanoimprint Lithography

吳重謙(Chung-Shian Wu)

指導教授 ： 徐澤志

元智大學/工程學院/機械工程學系/碩士(2005年)

摘要

奈米壓印技術是提昇製造更微小結構的重要方法之一，但現階段對於奈米尺度的許多現象尚無法充分掌握。在奈米壓印製成的冷卻過程中過大的壓力將使模仁轉角處產生應力集中，造成材料破壞；但壓力太小又會因拘束不足而使轉印效果變差，所以施加的壓力值可參考高分子完全充填所需的最小壓力。如此即可有效的減少實驗的次數，並利用實驗進一步改善轉印效果。本研究利用有限元素法將高分子假設為橡膠彈性體，並以此模型來模擬壓印製程中，高分子在模穴中的充填情形。目的是希望能透過電腦模擬，預估在不同壓力下，不同的模穴寬度、間距與區塊距離，壓印後的充填狀況。並以實驗得到高分子成型後的形狀，與模擬做比對後，進一步得到高分子欲完全充填所需的最小壓力。

關鍵字

奈米壓印 ； 有限元素法

並列摘要

Nanoimprint lithography is one of the most important methods to improve the precision of micro fabrication process, however the manufacturing parameters such as imprinting pressure, mold temperature, aspect ratio of the recessed groove, and initial thickness of polymer are difficult to determine. The higher imprinting pressure creates a stress concentration at the corner of the polymer and then induce the defect of the polymer at the cooling process. On the other hand, incomplete filling ratio is observed if imprinting pressure is not higher enough and perfect pattern will then not be formed on the surface of the polymer. A finite element software MARC is applied in this paper to investigate the correlation among these manufacturing parameters. The computer simulation was based on a rubber elastic model and the profile obtained from the simulation agreed well with the experimental data. The minimum imprinting pressure which cause 100% filling ratio and prevent the specimen defects is found and further reduce the time of trial and error.

並列關鍵字

nanoimprint lithography ； finite element analysis

參考文獻

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