以化學浴沉積法在銅基板上製備氯化亞銅薄膜之特性研究

Fabrication of cuprous chloride films on copper substrate by chemical bath deposition

林郁廷(Yu-Ting Lin)

指導教授 ： 溫武義

中原大學/電機資訊學院/電子工程研究所/碩士(2015年)

https://doi.org/10.6840/CYCU.2015.00396

摘要

本研究為首次使用化學浴沉積法於銅基板上製備氯化亞銅薄膜，發現沉積過程中加入鹽酸處理方法可獲得完全覆蓋之氯化亞銅薄膜。從低溫（6.4 K）光激螢光量測中可清楚地測得激子及雙激子之發光特性，此外，於室溫量測中可測得自由激子之發光，而此特性意謂薄膜品質佳。
　　另外，為了改善薄膜之晶相品質，本研究也調查了回火對氯化亞銅的影響，值得一提的是，於X射線光電子能譜儀（XPS）量測中發現回火150℃-1hr的樣品之Cl 2p束縛能較未回火強，因此，推測回火有助於提升薄膜品質。除此之外，有關回火研究的部分也詳盡地進行了光激螢光量測，而變溫量測的部分中發現不同於文獻的發光特性，隨著量測溫度增加而自由激子發光的強度隨之增強，其現象歸因於其它激子的影響。

關鍵字

氯化亞銅 ； 激子 ； 光激螢光 ； 化學浴沉積法 ； 銅基板

並列摘要

For the first time, polycrystalline CuCl films were fabricated by chemical bath deposition (CBD) on a Cu substrate at 90 C. Further, interrupting the film deposition and including an HCl dip treatment of the film growth surface facilitated the deposition of a full-coverage CuCl film. Both the excitonic and biexcitonic emission lines were well-resolved in the 6.4 K photoluminescence spectra. In particular, the free exciton emission line was observable at room temperature, indicating the good quality of the CuCl films prepared by CBD.
　　Whereas, the CuCl films were prepared with annealing for improving the quality of the crystallization. It is worth mentioning that the concentration of Cl- in the sample annealed at 150℃ for a time duration of 1hr was higher than the as-grown one. It might be interpreted that the quality of the CuCl films performed with annealing is superior to those without annealing. In addition, I also have reported the Photoluminescence mechanisms of the CuCl films in detail. The PL spectra have been reported in detail that the influence from the other emissions increased the free exciton emission when the temperature increased. The transition is quite different from the results reported in previous literature.

並列關鍵字

CuCl ； exciton ； photoluminescence ； chemical bath deposition ； copper substrate

參考文獻

[1] O. Ambacher, J. Phys. D: Appl. Phys. 31 (1998) 2653.

[3] M. Ueta, T. Goto, J. Phys. Soc. Jpn. 20 (1965) 401.

[8] Y. Masumoto, S. Okamoto, S. Katayanagi, Phys. Rev. B 50 (1994) 18658.

[10] K.V. Rajani, F. Olabanji Lucas, S. Daniels, D. Danieluk, A.L. Bradley, A. Cowley, M.M. Alam, P.J. NcNally, Thin Solid Films 519 (2011) 6064.

[12] F.O. Lucas, L. O’Reilly, G. Natarajan, P.J. McNally, S. Daniels, D.M. Taylor, S. William, D.C. Cameron, A.L. Bradley, A. Miltra, J. Cryst. Growth 287 (2006) 112.