以低射頻功率沈積氧化錫薄膜的特性之研究

氧化錫通常以一氧化錫(SnO)及二氧化錫(SnO2)此二種形式存在，而且鮮少有報導關於氧化錫的單一相之形成及擇優取向薄膜的成長。本研究是採用射頻磁控濺鍍法，以低射頻功率沈積SnO薄膜，並可獲得SnO單一相，且對應於正交晶結構及呈(110)擇優取向成長。藉著增加射頻功率或降低氬氣壓力，透光的SnO薄膜呈現較高的表面粗糙度及較好的疏水性質。相較於裸玻璃，披覆SnO薄膜的玻璃則呈現疏水性及具紫外光-可見光-近紅外光區之光選擇性，有助於光學應用的改善。

關鍵字

氧化錫；射頻磁控濺鍍法；射頻功率；氬氣壓力；疏水性質；光學應用

並列摘要

Tin oxide exists in two forms of stannous oxide/tin monoxide (SnO) and stannic oxide/tin dioxide (SnO2). There are few reports on its formation of single phase and/or growth of epitaxial/oriented thin film. The SnO films are deposited at low RF power using RF magnetron sputtering in this study. A broad diffraction peak (110), corresponding to nanocrystalline orthorhombic SnO, is observed. By increasing the RF power or decreasing the Ar pressure, the transparent SnO films exhibit higher surface roughness and better hydrophobicity. On comparing with the pure glass, the SnO-deposited glass exhibits hydrophobicity and had optical selection in the UV-VIS-NIR region for improving optical application.