CrN 和CrON薄膜具良好的化學穩定性及熱穩定性,廣泛使用於高溫操作環境。藉由反應式磁控濺鍍製程於304不鏽鋼基材(SS)濺鍍 CrN(H)/CrN(L)/CrON/AlO堆疊吸收膜應用於高溫性能探討。使用橢圓偏光儀量測CrN(H), CrN(L), CrON and AlO薄膜的折射率及消光系數。場發射掃描電子顯微鏡(FE-SEM) ,穿透式電子顯微鏡(TEM),能量散射光譜儀(EDS)及低掠角X光繞射儀(GIXRD)用以測量薄膜化學組成及結構。使用紫外線/可見光/近紅外光分光光譜儀(UV/VIS/NIR)和傅里葉轉換紅外光譜(FTIR)裝置積分球分別量測SS/CrN(H)/CrN(L)/CrON/AlO吸收體的吸收率(α)及熱輻射率(?)光學性質。探討SS/CrN(H)/CrN(L)/CrON/AlO組成膜層厚度改變對光學性能的影響及其高溫熱穩定性。實驗結果顯示此堆疊吸收膜具有高的α (0.935),及低的熱輻射率ε (0.03)。經大氣下400°C熱處理216小時,其此吸收率及熱輻射率分為0.920及 0.01,顯示CrN(H)/CrN(L)/CrON/AlO堆疊吸收膜展現良好的熱穩定性。
CrN and CrON films exhibit excellent chemical and thermal stabilities at high-temperature applications. Spectrally selective CrN(H)/CrN(L)/CrON/AlO tandem absorbers were deposited on stainless steel (SS) substrates by reactive magnetron sputtering for high-temperature solar performance. The refractive indexes of the CrN(H), CrN(L), CrON and AlO films were obtained by using an ellipseometer. The chemical composition and structure of the studied films were characterized using field-emission scanning electron microscopy, transmission electron microscopy, energy-dispersive x-ray spectrometry, and grazing-incidence x-ray diffraction. The ultraviolet/visible/near-infrared and fourier-transform infrared spectrophotometers were used to measure the optical properties of SS/CrN(H)/CrN(L)/CrON/AlO tandem absorbers. The effect of the thickness of stacking films on the optical properties and the high-temperature thermal stability of SS/CrN(H)/CrN(L)/CrON/AlO tandem absorbers were investigated. Experimental results show that the optimal SS/CrN(H)/CrN(L)/CrON/AlO tandem absorber displays a high absorptivity (α) of 0.935 and a low emissivity (ε) of 0.03. The optical properties of this absorber was stable (α/ε = 0.920/0.01) after heating at 400°C in air for 216 h, indicating that the SS/CrN(H)/CrN(L)/CrON/AlO tandem absorber exhibited superior thermal stability.