五自由度微動平台之建構與奈米級雙軸循軌量測系統之研發

The Developments of Flexure Hinge Based Stack-Type 5 DOF Nanometer-Scale Stage for a Heavy-Loading Machining Process and a New Nano-Contouring Measurement Technique

鄧雲峰(Yun-Feng Deng)

國立虎尾科技大學/工程學院/動力機械工程研究所/碩士(2005年)

摘要

本篇論文主要研究可分為兩方面，一是重負荷五自由度
積木式微動平台之建構；二是奈米級雙軸循軌量測系統之研
發。
在半導體製程設備中，需要高精度之微定位平台，因此
在本文中建立具有高定位精度與多自由度微動平台及其量
測校正系統。本文中五自由度微動平台之建構，主要乃是利
用撓性體具有材料彈性變形的特性設計組裝完成，並搭配壓
電致動器以提供高定位精度，本文中所研發製成的重負荷五
自由度積木式微動平台，其理論結果與實驗結果吻合，而其
微動平台在 X 軸可達 52.76μm 位移量、 Y 軸可達 51.79μm 位移量、
Z 軸可達 12.08μm 位移量、最小位移解析可達 1nm， θx 旋轉量
185μrad、 θy 旋轉量 277μrad,共振頻率 1.25kHz，且微動平台可
以承受 12 公斤而作動。
而在量測系統方面，本文中藉由不同的鏡組擺設方式，
提出三種可同時達到奈米等級精度的創新雙軸循軌量測系
統，其量測解析可達 1nm。

並列摘要

The main research of this paper can be divided into two respects,
the first is that development of flexure hinge based stack-type 5 DOF
micro-stage for a heavy-loading machining process; the second is that
development of a new nano-contouring measurement technique.
In semiconductor manufacturing facility, the ability to etch the
minimum line width of IC process depends on the positioning resolution
of the fine motion stage. The construction of 5 DOF micro-stages in this
paper is to complete assembly using the characteristic of distortion of
flexible ware and provide high accuracy positioning in conjunction with
the piezoelectric actuators. A 5 DOF micro-stage were designed,
fabricated, and tested. For the validity of the derived theoretical model,
the results of the theory and experiment are all examined. The
comparison of the results by theory and experiment shows good
agreement. The performance of the micro-stage has 52.76μm travel
along the x-axis, 5l.79μm ravel along the y-axis, 12.08μm travel along
the z-axis and lnm resolution, and 185μrad along θx-axis, and 277μrad
along θy-axis, and resonance frequency of l.25kHz. The micro-stage
also can support 12 kilograms to move.
As with measurement system, there kinds of contouring
measurement systems that can reach nano-level accuracy and be built by
means of there different kinds of lens group placing methods are
formulated in this paper. The resolution of the measurement is 1nm.

參考文獻

[49] Ni, J., Huang, P. S., Wu, S. M., "A Multi-degree-of-Freedom Measuring System

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