積體光學高分子光波導及布拉格反射光波導之研製

Development and Fabrication of Polymer Optical Waveguide and Bragg Reflection Waveguide

張美如(Mei-Ju Chang)

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2005年)

摘要

本論文提出以結合黃光微影與軟式模仁新穎的製程技術，製作出低損耗的高分子光波導元件。Bragg 反射波導是光波長補/取多工器(Optical Add/Drop Multiplexing; OADM)中最重要主要元件，其製作也是使用吾人所提出類似的製程方式。單一模態高分子光學波導是使用SU-8 和OG 系列高分子當成導光層(Guiding Layers)，利用end-fire coupling 和 cut-back techniques的方法量測模態值，證明可得到良好的光傳輸特性。高分子布拉格光柵反射波導是使用OG 高分子與翻模轉印的彈性印章(stamping)技術, 即可容易獲得至少350 nm 深的光柵(Grating)。其光學傳輸特性可由光頻譜分析儀(OSA)所測量得知。

並列摘要

In this thesis, we proposed a novel process, which incorporates with the photolithography and soft molding techniques, to fabricate the low loss polymer optical waveguides. In the meanwhile, a Bragg reflection waveguide, being a key component of optical add drop multiplexer (OADM), was also fabricated using such process. Single mode polymer optical waveguides were fabricated in terms of SU-8 and OG series polymer as the guiding layers, and good transmission characteristics were verified using the end-fire coupling and the cut-back techniques. The polymer Bragg grating reflection waveguide was fabricated in terms of OG polymer with stamping transfer techniques, and 350 nm grating depth can be easily obtained. The optical transmission characteristics were measured in terms of optical spectrum analyzer (OSA).

參考文獻

sitivity in Optical Fiber Waveguides: Application to Reflection Filter

[3] Lorenz, H., Despont, M., Fahrni, M., LaBianca, N., Vettiger, P., and Renaud, P., ”SU-8: a low-cost negative resist for MEMS,” J. Micromech. Microeng. 7, pp.121-124 (1997).

[4] Zhang, J., Tan, K. L., Hong, G. D., Yang, L. J., Gong, H.“Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS,” J. Micromech. Microeng. 11, pp.20-26 (2001).

[6]D.K. Cheng, Fundamentals of Engineering Electromagnetics, Addison-

Wesley Publishing Company, 1993.