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  • 學位論文

以 H-PDMS 在高分子上製作高解析彎曲波導

Fabrication of high-resolution polymeric bending waveguides by using H-PDMS process

指導教授 : 何智廷
共同指導教授 : 李安謙
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摘要


本研究以 H-PDMS 在高分子上製作高解析彎曲波導,且結合黃光微影製程(Photolithography)、微膜轉印技術(Micro-Molding Process)及微膜壓印技術(Micro-Printing Process)去做結合。 首先,本研究中製作了三種製程,使用兩種高分子材料 PDMS 及 H-PDMS 聚二甲基矽氧烷材質,透過黃光微影製程製作SU-8厚膜光阻彎曲波導元件,接著配合微接觸成形(Micro-Contact Printing)技術與複製成形(Replica Molding)技術製作UV高分子OG彎曲波導模仁,最後比較三種製程和不同的高分子材料對波導元件影響。 本文是以掃描式電子顯微鏡(Scanning Electron Microscope, SEM)與光學顯微鏡(Optical Microscope) 等方法觀察與紀錄實驗之結果,並研究探討。

關鍵字

H-PDMS 波導 轉印技術 壓印技術

並列摘要


This project is to study the process by using of H-PDMS to fabricate a polymeric high-resolution bending waveguide structures component along with photolithography and micro molding process and micro printing process. In this study, three processes and two polymer materials PDMS and H-PDMS polydimethylsiloxane materials were used to fabricate the component. First, a photolithographic process was used to fabricate SU-8 bending waveguide components, and then by using the Micro-Contact Printing technology and Replica Molding technology to fabricate UV polymer OG bending waveguide components. Finally, three different processes and different polymer materials that used to fabricate bending waveguide component were compared. In this study, a scanning electron microscope (SEM) and optical microscope (OM) were used to observe and record test results.

參考文獻


通道”,國立成功大學化學工程學系, 2008/6.
[1] Watanabe, M. Tsuchimori, A. Okada, and H. Ito, “Mode selective polymer channel waveguide defined by the photoinduced change in birefringence”, Appl. Phys. Lett., vol. 71, pp. 750–752, 1997.
[2] T.C. Sum, A. A. Bettiol, J. A. van Kan, F. Watt, E. Y. B. Pun, and K. K. Tung, “Proton beam writing of low-loss polymer optical waveguides”, Appl. Phys. Lett. 83, 1707 , 2003.
[3] D.B. Ostrowsky and A. Jacques, “Formation of optical waveguides in photoresist films”, Appl. Phys. Lett. 18, 556 ,1971.
[4] Chang-Yen, D.A.; Eich, R.K.; Gale, B.K.,”A monolithic PDMS waveguide system fabricated using soft-lithography techniques”,Lightwave Technology, Journal of Volume 23, Issue 6, June 2005 Page(s):2088 – 2093.

被引用紀錄


陳昱甫(2012)。以微模轉印製程及外加電場極化方法在高分子上製作漸變折射率波導〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-1406201216352300
胡育霖(2013)。在陽極氧化鋁上製作抗-反射結構〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-0107201316240500
吳穎聰(2013)。以微模轉印製程製作高分子脊樑式波導光柵濾波器〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-2706201300540400

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