本研究以簡單複製製程高分子彎曲波導並以製作高解析的週期 結構元件,且結合全像術干涉微影(holographic interference lithography)技術、黃光微影製程(photolithography)、微模轉印技術(micro-molding process)。 首先,全像術干涉技術使用He-Cd雷射在負光阻上製作奈米級之 週期結構,並且此繞射光柵元件利用PDMS做為特徵的轉印。接著,結合黃光微影製程技術製作出高分子彎曲波導元件。 最後,我們將成功的以為轉印技術製作出結合繞射光柵與高分子 彎曲波導元件。本文最後以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)與光學量測等方法觀察與紀錄實驗之結果,並研究探討。其光學傳輸特性可由光頻譜分析儀(OSA)所測量得知。
This project is to study by using a simple procedure to fabricate a polymer bending waveguide of high-resolution periodic structures component along with holographic interference lithography photolithography and micro molding process. First, holographic interference using a He-Cd (325nm) laser was used to create the master of the periodic structure on an i-line sub-micron positive photoresist film. This diffraction grating component was using PDMS as the transfer mold pattern. Next, fabricate polymer bending waveguide components was fabricated by photolithography. Finally, We have successfully produced a combined diffraction grating components and the structure of the bending waveguide by micro-molding process.In this experiment results are measured and observed by AFM and SEM. The optical transmitting features are measured through the OSA.