電光探測技術之應用研究

本論文中，我們提出兩種外部式電光探測技術新的應用。首先，將這個非接觸式的探測技術延伸至量測電子電路上的直流偏壓，利用在鉭酸鋰(LiTaO3) 電光晶體製成的探頭配置一側邊接地電極及由待測電路之電源供應端輸入一調變信號，此信號將驅動之電路上的各節點偏壓訊號，此系統可由電光探針經由高靈敏的鎖相放大器量測。實驗結果顯示了這個新的電光探測系統具有免除、減少在量測因為校正、量測時由探針高度變化所造成的量測誤差。另外，在電光晶體結合迴路天線應用於磁場的量測方面，我們提出的磁場探針以Fabry-Perot效應來提高測量訊號時系統的靈敏度，而這是利用片狀的LiTaO3晶體分別鍍上高反射係數之薄膜構成Fabry-Perot共振腔，實驗結果顯示使用Fabry-Perot效應可提昇系統的靈敏度一個數量級(20 dB)以上。此外，本論文也探討聚偏二氟乙烯(PVDF)高分子電光薄膜的製作技術與量測結果。

關鍵字

電光高分子；法布里-比洛；電光探測技術；鉭酸鋰

並列摘要

In this thesis, we propose two new applications of the traditional non-contact electro-optic (EO) probing technique. First, this technique is further extended to measuring DC bias voltages on analog circuits through using a special external LiTaO3 probe equipped with a grounded side-electrode. A power supply modulation method is adopted to make all DC bias voltages on the circuits can be picked up by the EO probe tip using a high sensitivity lock-in amplifier. Test experiments on model circuits demonstrated that the proposed new EO probe system was relatively immune to tip position variations and its measured results were in good agreement with the standard known values. Then, this technique is also extended to Electro-optic Magnetic Field measuring. The Electro-optic Magnetic Field probe utilizes Fabry-Perot effect to enhance the sensitivity. The sensing head is made A plate LiTaO3 crystal with high reflection coating on its up and bottom side. The experiment shows that the sensitivity con be improved by an order of magnitude. Besides, we also study the process for the fabrication of PVDF electro-optic film and the results are discussed.

並列關鍵字

electro-optic polymer ； Fabry-Perot ； electro-optic probing technique ； LiTaO3

參考文獻

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[4] D. M. Mechtel, H. K. Charles Jr, and A. S. Francomacaro, “Laser-based electro-optic testing of multichip module structures,” Microelectronics reliability, Vol. 38, pp. 1847-1854, 1998.

[5] G. David, T. Y. Yun, M. H. Crites, J. F. Whitaker, T. R. Weatherford, K. Jobe, S. Meyer, M. J. Bustamante, B. Goyette, S. Thomas III, and K. R. Elliott, “Absolute potential measurements inside microwave digital IC’s using a micromachined photoconductive sampling probe,” IEEE Transactions on Microwave Theory and Techniques, Vol. 46, pp. 2330-2337,1995.

[6] W. Mertin, “New aspects in electro-optic sampling,” Microelectronic Engineering, Vol. 30, pp. 365-376, 1996.

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電光探測技術之應用研究

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