藉由置入奈米銅結構以提升超薄摻鋁氧化鋅膜層光電特性之研究

Enhancement of optoelectronic properties by inserting nano-Cu structures in ultra thin Al-doped ZnO layer

黃偉哲(Wei-Che Huang)

指導教授 ： 林彥勝

義守大學/電機資訊學院/電子工程學系/碩士(2014年)

摘要

本研究藉由設計不同的ZnO種子層厚度，不同的置入Cu厚度及在ZnO種子層表面進行不同微粗化製程來探討ZnO/nano-Cu/AZO膜層結構之光電特性。研究中由射頻磁控濺鍍系統(RF magnetron sputtering)完成濺鍍ZnO/nano-Cu/AZO結構之透明導電薄膜，並以原子力顯微鏡（atomic force microscope，AFM）與掃描式電子顯微鏡（scanning electron microscope，SEM）觀察其平均粗糙度與表面結構分析，藉由霍爾量測(Hall measurement)與紫外光/可見光分光光譜儀( UV/VIS Spectrophotometer)量測其結構之光電特性，再以X-ray繞射(X-ray Diffractometer，XRD)觀察薄膜結晶特性。研究結果發現當膜層結構為ZnO(40nm)/nano-Cu(5nm)/AZO(40nm)，其中ZnO種子層在使用0.1wt% KOH進行濕式蝕刻且蝕刻時間為150秒時，具有最高的光電效益值指數為1.3 ×10-2Ω-1，此時膜層之電阻率為1.3×10-4 Ω-cm，於可見光波長範圍400nm~800nm之平均穿透率可達85.5%。

關鍵字

摻鋁氧化鋅 ； 奈米銅 ； 氧化銅 ； 射頻磁控濺鍍機 ； 超薄AZO膜層 ； 光電效益值

並列摘要

In this study, the main research is to grow the ZnO/nano-Cu/AZO thin film, the different Cu thickness had been sputtered on ZnO seed layer, which had been treated with different micro-roughening after wet etching, all the film were designed and grown by RF magnetron sputter. The atomic force microscope (AFM) and scanning electron microscope (SEM) was used to observe the surface roughness and morphology. The X-ray diffraction was used to analysis the crystal structural characteristics. The optoelectronic properties were measured by UV spectroscopy and Hall measurement system. The results shown the structure of ZnO(40nm) /nano-Cu(5nm)/AZO(40nm) has the best figure of merit (FOM) as 1.3 ×10-2Ω-1, which means the lower resistivity as 1.3×10-4 Ω-cm and the higher transmittance within visible range as 85.5% had been grown in our study.

並列關鍵字

Al doped-ZnO ； nano-Cu ； CuO ； RF magnetron sputtering ； figure of merit

參考文獻

[1]D.R. Sahu, Shin-Yuan Lin, Jow-Lay Huang﹐Thin Solid Films Vol.516,pp.4728–4732, 2008.

[2]Joachim Muller, Bernd Rech, Jiri Springer, Milan Vanecek Solar Energy Vol.77,pp. 917–93, 2004.

[3]Y.P. Wang, J.G. Lu, X. Bie, Z.Z. Ye, X. Li, D. Song, X.Y. Zhao, W.Y. Ye Applied Surface Science ,Vol.257,pp.5966–5971, 2011.

[4]Gregory J. Exarhos, Xiao-Dong Zhou, “Discovery-based design oftransparent conducting oxide films”, Thin Solid Film, Volume 515,pp. 7025-7052, 2007.

[5]王一全，‘‘藉由成長奈米銀結構輔助超薄摻鋁氧化鋅膜層光電特性之研究”義守大學電子工程學系，2013。