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  • 學位論文

石英表面拋光技術設計與開發

Design and Develop for the Quartz parts of the Polishing Technology

指導教授 : 蔡逢哲

摘要


本研究主要針對目前業界化學機械拋光(Chemical Mechanical Polishing ,CMP)製程所使用之軟質拋光墊,設計一套熱熔膠材質噴塗設備來取代軟性拋光墊,並搭配拋光模組來達到成本降低與縮短工時之目的。 在石英拋光過程中,業界所使用的拋光方式以化學機械研磨為主(CMP),設備多為下壓式,普遍採用螺桿或氣體壓力施予適當荷重,但以上方式仍會造成拋光壓力不易掌握導致拋光效果不佳等問題。針對此問題本研究提出吊掛式荷重的概念,使用滑軌與導輪製作能將加工槽體做升降運動之機構,再以吊掛荷重方式,將加工槽體做荷重壓力之調整,能夠確保拋光過程達到全程相同之荷重壓力,以達到更好的拋光效果,再結合田口方法取得熱熔膠拋光墊之可行性與拋光模組搭配熱熔膠拋光墊之參數最適化,可將表面粗糙度(Ra)為 0.42 μm Ra (Rmax為4.57 μm Rmax)的銑削加工面降至0.24 μm Ra (0.92 μm Rmax),改善率達57%,表面呈現近似於透明的效果。以目前業界使用上對於CMP拋光所使用之拋光墊需求量大,且又仰賴國外進口,本研究可以提供業界一自製與降低成本之方法,更可以提高國內競爭力。 關鍵字:石英、拋光墊、表面處理、田口方法

關鍵字

石英 拋光墊 表面處理 田口方法

並列摘要


This study focused on the industry's chemical mechanical polishing (Chemical Mechanical Polishing, CMP) process used by the soft polishing pad, a hot melt adhesive material spraying equipment designed to replace the soft polishing pad, and with a polished module to achieve lower costs and shorten The purpose of the work. In the quartz polishing, polishing mode industry used mainly by chemical mechanical polishing (CMP), equipment, mostly under the pressure, commonly used screw or gas pressure applicator suitable load, but still way above the pressure caused by the polishing difficult to master resulting in ineffective polishing and other issues. To solve this problem hanging concept proposed in this study load, the use of the lifting movement of the slide mechanism and the guide wheel production processing tank can do, then hanging load mode, the processing tank load pressure is adjusted, to ensure that polishing process to achieve full load pressure of the same, in order to achieve a better polishing effect, combined with the feasibility Taguchi methods to obtain a polishing pad with a polishing hot melt mix parameter module optimizing the hot melt adhesive of the polishing pad, the surface roughness can be (Ra) of 0.42 μm Ra (Rmax of 4.57 μm Rmax) of the surface milling down to 0.24 μm Ra (0.92 μm Rmax), to improve the rate of 57%, similar to the transparent surface showing effect. In the industry for the use of the CMP polishing pad used in the high demand, and because it relies on foreign imports, the present study provides the industry with a homemade method of reducing costs, but also improve the competitiveness of the country. Keywords: quartz, polishing pad, surface treatment, Taguchi method

參考文獻


中文參考文獻
1.王彥松(2003)。單晶α相氧化鋁晶圓基板平坦化加工研究。國立台灣科技大學
2.石正宜(2010)。修整器設計及固定奈米鑽石拋光墊於改進化學機械拋光性能之研究。國立清華大學。
3.江志祥(2014)。運用田口方法改善鋰離子電池組測試之效率。國立臺北科技大學。
4.何碩洋(2002)化學機械拋光中拋光墊修整參數影響之研究。國立清華大學

被引用紀錄


楊敏慧(2008)。營利事業佣金支出之研究〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu200900665
喻振邦(2007)。TRIZ 四十發明原則在公司治理與內部稽核之應用〔碩士論文,亞洲大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0118-0807200916280118

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