真空燒結與熱均壓製程對Cr50Cu50合金靶材微結構及其性質之影響

Effects of Vacuum Sintering and Hot Isostatic Pressing Processes on the Microstructure and Properties of Cr50Cu50 Alloy Targets

張世賢(S. H. Chang) ； 陳敬騏(C. C. Chen) ； 梁誠(C. Liang) ； 陳思宏(S. H. Chen)

《鑛冶：中國鑛冶工程學會會刊》 55卷4期 (2011/12) Pp. 22-26

https://doi.org/10.30069/MM.201112.0004

摘要

以往純金屬與合金靶材通常以熔煉鑄造方式製作，然而鉻銅合金靶材以熔煉方式製造時容易產生成分偏析、微結構不均勻與多孔性等缺陷，即使後續經熱處理或熱加工亦無法將缺陷完全去除。因此，本研究利用粉末冶金之真空燒結（Vacuum Sintering）及熱均壓（HIP）的方式製備鉻銅合金靶材，並藉由進行一系列的實驗測試，以探討不同粉末冶金製程對鉻銅合金靶材性質之影響。實驗結果顯示，Cr50Cu50真空燒結靶材再經過1050℃ 175 MPa 4 hours熱均壓處理後，相對密度可達到99.42 %，視孔隙率降低至0.54 %，此一結果顯示利用熱均壓處理能有效消除靶材內部封閉孔隙，並獲得高緻密度與高性質之鉻銅合金靶材。

關鍵字

鉻銅合金靶材 ； 真空燒結 ； 熱均壓

並列摘要

Pure metal and alloy targets were usually made by melting and casting methods. The Cr-Cu alloy targets often have ingredient segregation, non-uniform microstructure and porosity defects. Subsequent heat treatment and hot-working process cannot fully eliminate defects. In this study, we produced the Cr-Cu alloy targets via vacuum sintering and hot isostatic pressing (HIP) of powder metallurgy. We performed a series of experimental tests to determine the characteristics and effects of different powder metallurgy processes on the Cr-Cu alloy targets. The experimental results show that the relative density of Cr50Cu50 vacuum sintering targets can reach 99.42 %, and apparent porosity 0.54 % after 1050℃ 175 MPa HIP treatments for 4 h. It shows that HIP treatments can be used to obtain the high density and high quality Cr-Cu alloy targets while eliminating the closed pores.

並列關鍵字

Cr-Cu alloy targets ； Vacuum Sintering ； HIP