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高電流離子植入機之參數最佳化選擇-以U公司為例

High Current Ion Implanter of Parameters Base on the Best Choose-A Case Study of U Group

摘要


為了使電晶體擁有高傳導率,離子植入技術運用鍺(Ge)元素於超淺接面(USJ)製程中,但Ge在USJ製程中劇烈的化學反應,造成高電流離子植入機的生產利用率大幅縮短,導致高電流離子植入機台參數需要重新調整。在資源有限的情況下,如何有效率的找出解決方案並制定相關的配套措施成為目前最重要的問題。本研究方法為應用專案管理流程組織研究架構並透過機台原理建立魚骨圖,找出關鍵因子,利用實驗設計中的田口法找出各參數之間的關聯性,其研究目的使輸入參數最小,轉換效率最大來執行參數最佳化,歸納整理可能影響製程的調機參數,建立參數最佳化的方法,而研究貢獻以有效率的找出最佳參數來提升離子植入機的生產利用率,最後將Filament、Arc、Magnet及X、Y、θ三軸參數結合並建立流程圖,做為設備管理中的標準操作程序規範。

並列摘要


In order to make transistor own high conductivity, an application of germanium(Ge) material is in Ultra-Shallow Junction (USJ) process. But the Ge is has violent chemical reaction in process. Moreover, High Current(HC) Ion Implanter utilization rate crash to from Ge process. So we need re-set up tool parameters. How to efficient find the solution become very important. The purpose of this article is efficient to find every parameter base on the best level. The methodology of this case use project management concept to organize research process. Moreover, use cause-and-effect chart identify key parameters base on implant theory, then use Taguchi's design to find every parameter the best level and significant rank. Finally, we build standard operating procedure(SOP) base on the rank and implanter theory. The main contribution is efficient find every parameters the best level to promote utilization rate, and to set up SOP for equipment management is according with it.

並列關鍵字

Taguchi's Method HC Ge Project Management

參考文獻


王瀷平(2010)生產排程與保養整合–離子植入設備之生產排程. 臺灣大學工業工 程學研究所學位論文。
吳家榮(2008), 半導體製程設備裝機工程管理之研究—以t 公司 12 吋晶圓廠 為例. 成功大學工學院工程管理專班學位論文
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