添加界面劑對電鍍Cu2O膜表面結構與特性之影響

Effect of surfactants on the microstructure and characteristic of Cu2O films by electrochemical deposition

蔡承翰(Tsai-cheng han)

指導教授 ： 胡毅

大同大學/工程學院/材料工程學系所/碩士(2009年)

摘要

氧化亞銅是一種不昂貴且無毒性之半導體,能帶寬度約為2.1eV,且具有在可見光區吸收細數大,故可應用於太陽能電池以及光觸媒.本實驗用電化學沉積製備氧化亞銅於不繡鋼上,藉由控制反應中的溫度以及反應電位,以X光繞射儀與掃描電子顯微鏡來觀察薄膜之結晶結構與表面形貌.並分別添加有機酸.金屬離子以及界面活性劑,來談討結晶型態.

關鍵字

氧化亞銅 ； 電鍍

並列摘要

Cuprous oxide (Cu2O) is an inexpensive and non-toxic semiconducting material with a band gap of 2.1eV,and has high absorption in visible range for solar cell and photocatalysis applications.In the study,cuprous oxide were fabricated on stainless steel substrate by electrochemical deposition method at different solution temperature and reaction potential.The crystalline and morphology of the thin film were investigates with XRD and SEM.And discuss the morphology by doping organic acid,metal ionic,and cationic surfactant.

並列關鍵字

cuprous oxide ； electrochemical deposition

參考文獻

[1]Buckley, “Crystal growth ”,Harold Eugene(1897)

(1988) p.309

spafion-depositlitting(Ⅱ)ned Cu2O ”,Applied Catalysis A:

[4]H Maruska,A K Ghosh., “Photocatalytic decomposition of water at

[5]T Takata, S Ikeda,A Tanaka at al., “Mechano-catalytic overall water