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氣體噴灑模組於光電鍍膜設備之應用

Application of Showerhead Module in Optoelectronic /Semiconductor Deposition Equipment

摘要


國內光電及半導體產業發展已累積有40年的歷史,其上、中、下游產業結構已相當完整,是我國持續發展推動的重點產業,亦是全球創新研發的新契機所在。光電半導體之真空CVD 鍍膜為其重要的關鍵製程,其設備中使用之氣體噴灑模組更是為其關鍵零組件,攸關腔體內製程氣體之層流均佈而使薄膜能均勻沉積,並掌握鍍膜的品質與良率。本文針對各種氣體噴灑模組應用於CVD 鍍膜設備之型式及設計加以探討,並介紹工研院機械所開發之氣體噴灑模組研發技術現況,以期協助國內建立光電半導體鍍膜設備產業與其關鍵零組件之發展,奠定「技術產品國產化、產業價值高值化」的發展目標。

並列摘要


Optoelectronics and semiconductor industries have been developed for 40 years in Taiwan, and thus the upstream and downstream industrial structure is nearly complete. It has been the key industry with sustainable support from government and with the global innovation opportunity for the future product development. Vacuum CVD deposition used in optoelectronic and semiconductors is a crucia process. The showerhead module is a key component used in the CVD to generate laminar flow of the process gases, which can then be uniformly distributed into the chamber to improve quality and yield rate of deposited films. This article discusses the types and design of various showerhead modules in the CVD deposition equipment and introduces the research status of the showerhead module developed by ITRI. We look forward to establish a technology for key components used in optoelectronic/semiconductor deposition equipment, in order to achieve the long term goal of "technology made domestic and product made high-value".

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