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  • 學位論文

高效率壓電厚膜氣膠沉積製程設備之開發

Development of High Efficiency Aerosol Deposition Apparatus for Piezoelectric Ceramic Thick Film

指導教授 : 吳文中
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摘要


氣膠沉積法因為具有相對鍍率高、沉積出的厚膜品質高和對製程環境要求低等特性,因此相當適合應用於沉積壓電厚膜和壓電元件製程中。在本研究中,我們以含有螺旋桿送粉設備的氣膠產生系統為基礎開發不同於以往的氣膠沉積製程設備,利用螺旋桿送粉設備將壓電粉末輸送進系統中進而讓壓電粉末和載體空氣混合形成氣膠,讓製程設備更適合未來將氣膠沉積製程設備往自動化發展。以本研究開發之氣膠沉積製程設備並在通入載體空氣流率5000 SCCM的情況下,重複噴塗30次可以沉積出膜厚約1.71 μm的壓電厚膜;將壓電厚膜經過520℃高溫退火處理3小時後進行鐵電分析得知本研究製備的壓電厚膜之殘餘極化量約為19.52 μC/cm2,此鐵電分析結果證實本研究製備之壓電厚膜具有相當程度的鐵電特性,細部實驗設計與研究成果將於本論文中說明。

並列摘要


The aerosol deposition (AD) method has the characteristics of high-speed deposition rate, low process environment restriction and the high ability to deposit high quality thick film in comparison with conventional thin-film/thick-film method or thermal spray coating technology. In this study, a new AD apparatus including an aerosol generator with screw feeder has been developed. The AD apparatus developed in this study has higher potential to be automatic in the future than previous apparatus. With the current AD apparatus set as 5000 SCCM carrier gas flow rate, 1.71 um of PZT thick film can be successfully deposited on a stainless steel substrate by PZT aerosol spraying repeatedly for 30 times. The PZT thick film after the annealing process is also confirmed to have ferroelectric property by ferroelectric hysteresis measurement and analysis. The experimental result also shows that the current AD apparatus has the feasibility to fabricate PZT thick film.

參考文獻


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